Ceramic Multi-Layer Implant Coating for Smoother Concave Surfaces
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Solution Overview
Problem
Applying hard, wear-resistant and oxidation-reducing multi-layer coatings on implants with concave geometries is challenging due to defects like pin holes and droplets, requiring extensive post-coat polishing to meet FDA standards.
Innovation Solution
A process using pulsed magnetron sputtering to deposit a ceramic multi-layer coating, which reduces defects and smoothens the surface, enhancing wear resistance and reducing friction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If cathodic arc deposition is used to apply multi-layer coatings, then hard and wear-resistant coating is achieved, but surface defects such as pin holes and droplets occur requiring extensive post polishing
Solution Approach 1:
The patent changes the deposition process parameters by using pulsed magnetron sputtering instead of cathodic arc deposition. This process parameter change results in different deposition mechanisms that produce smoother surfaces with fewer defects while maintaining coating hardness and wear resistance
Solution Approach 2:
The patent replaces the cathodic arc deposition process with pulsed magnetron sputtering process. This substitution of the deposition mechanism eliminates the formation of droplets and pin holes that are characteristic of arc deposition, thereby reducing the need for post-polishing operations
2Manufacturing precision
If extensive post coat polishing is performed to meet FDA standards, then surface finish compliance is achieved, but processing time and complexity increase especially for concave geometries
Solution Approach 1:
The patent performs the surface finishing action during the coating deposition process itself rather than as a subsequent separate operation. The pulsed magnetron sputtering process inherently produces a smooth surface finish during coating application, eliminating the need for extensive post-polishing operations
3Manufacturing precision
If pulsed magnetron sputtering is used to deposit ceramic multi-layer coating, then surface smoothness and wear resistance are improved, but coating process complexity increases
Solution Approach 1:
The patent uses a magnetron sputtering system that can deposit multiple ceramic layers with different compositions and properties in a single process setup. The same equipment and process framework can produce multi-layer coatings with varying hardness, friction, and wear resistance characteristics without requiring separate deposition processes for each layer
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The process results in a smoother surface with less defects, reducing the need for extensive polishing and extending the service life of implants.
Implementation Method 1
pulsed magnetron sputtering, in particular pulsed DC magnetron sputtering and high-power pulse magnetron sputtering, utilize comparatively high cathode voltages to accelerate inert and/or reactive gas ions to a sputter target leading to the emission of target material (ions, atoms etc.)
Implementation Method 2
Both deposition techniques utilize commercially available physical vapor evaporation (PVD) coating systems
Data Source
AI summary
A process for coating a medical implant includes the step of depositing a ceramic multi-layer coating on a surface of the implant via pulsed magnetron sputtering. The pulsed magnetron sputtering can be carried out as pulsed DC magnetron sputtering or high-power impulse magnetron sputtering. Pulses with a peak power density of 0.01 kW/cm2 to 30 kW/cm2 can be generated during the pulsed magnetron sputtering. In addition, pulses with a frequency of 10 Hz to 300 kHz can be generated during the pulsed magnetron sputtering. Moreover, pulses having a voltage of 200 V to 800 V can be generated during the pulsed magnetron sputtering. Furthermore, pulses having a duration of 10 μs to 200 μs can be generated during the pulsed magnetron sputtering. The process can be used to make implants, such as joint implants, having a ceramic multi-layer coating.