Imprint Apparatus Air Curtain Segmentation for Nanopatterning
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Solution Overview
Problem
In continuous nanopatterning processes, the existing techniques face challenges in preventing particle intrusion and uncured imprint material vaporization when forming patterns on multiple shot regions, leading to potential damage and pattern defects in the imprint process.
Innovation Solution
An imprint apparatus with a forming unit that creates an air curtain around the mold and substrate, featuring independent first and second forming units with adjustable gas flow rates to minimize particle intrusion and vaporization, ensuring accurate pattern formation across multiple shot regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-generated harmful factors
If the flow rate of the gas forming the air curtain is reduced to suppress vaporization of uncured imprint material, then vaporization is suppressed, but particle intrusion into the space between the mold and substrate increases
Solution Approach 1:
The forming unit is divided into a first forming unit and a second forming unit that are independent of each other. The first forming unit forms an air curtain for particle prevention, while the second forming unit forms an air curtain for vaporization suppression. This segmentation allows each unit to be optimized for its specific function without compromising the other.
Solution Approach 2:
Different regions of the forming unit have different gas flow rates tailored to local requirements. The first forming unit (for particle prevention) operates at a higher flow rate, while the second forming unit (for vaporization suppression) operates at a lower flow rate. This local differentiation resolves the contradiction by applying appropriate gas flow rates in different spatial locations.
2Object-affected harmful factors
If an air curtain is formed between the position where imprint material is supplied and the position where the mold contacts the imprint material, then particle intrusion is prevented, but the imprint material vaporizes
Solution Approach 1:
The air curtain formation is segmented into two independent units: the first forming unit creates an air curtain between the material supply position and the mold contact position to prevent particle intrusion, while the second forming unit creates an air curtain around the mold-substrate interface to suppress vaporization of uncured imprint material.
Solution Approach 2:
Different gas flow rates are applied in different locations: higher flow rate in the first forming unit for particle prevention, and lower flow rate in the second forming unit for vaporization suppression. This localized quality adjustment resolves the contradiction by matching gas flow characteristics to specific functional requirements.
3Object-generated harmful factors
If the flow rate of the gas forming the air curtain is reduced, then vaporization of uncured imprint material is suppressed, but the possibility of particle intrusion increases
Solution Approach 1:
The forming unit is divided into independent first and second forming units, allowing the first unit to maintain high gas flow for particle prevention while the second unit uses low gas flow for vaporization suppression, thus resolving the contradiction through functional segmentation.
Solution Approach 2:
Different gas flow rates are applied locally: the first forming unit operates at high flow rate for particle intrusion prevention, while the second forming unit operates at low flow rate for vaporization suppression, achieving both objectives simultaneously through localized quality differentiation.
4Productivity
If an imprint process is performed continuously on multiple shot regions, then productivity is improved, but uncured imprint material in other shot regions vaporizes when exposed to the air curtain
Solution Approach 1:
The forming unit is segmented into first and second forming units that can be independently controlled. During continuous processing of multiple shot regions, the second forming unit operates at reduced gas flow rate to suppress vaporization of uncured imprint material in regions not currently being processed, while the first forming unit maintains normal flow for particle prevention.
Solution Approach 2:
The gas flow rate of the second forming unit is dynamically adjusted based on the processing state. When the imprint process is continuously performed on multiple shot regions, the gas flow rate is reduced to prevent vaporization of uncured material in non-active regions, while maintaining particle prevention capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively suppresses particle intrusion and vaporization, maintaining the integrity of the mold and substrate while enabling continuous, high-accuracy nanopatterning on multiple shot regions, thereby improving the imprint process's reliability and productivity.
Implementation Method 1
a forming unit arranged around the mold and configured to form an air current (air curtain) that surrounds a space between the mold and the substrate
Implementation Method 2
gas such as clean dry air is used to form an air current (air curtain) that shields (surrounds) the space between the mold and the substrate to prevent the intrusion of the particle
Implementation Method 3
each of the first forming unit and the second forming unit includes an outlet which blows out gas for forming the air current from the side of the mold to the side of the substrate
Data Source
AI summary
The present invention provides an imprint apparatus for performing an imprint process which forms an imprint material pattern on a substrate by using a mold, including a forming unit arranged around the mold and configured to form an air current that surrounds a space between the mold and the substrate, wherein the forming unit includes a first forming unit and a second forming unit which are independent of each other, and each of the first forming unit and the second forming unit includes an outlet which blows out gas for forming the air current from the side of the mold to the side of the substrate, and the first forming unit and the second forming unit include portions, respectively, which overlap each other in a direction away from the space.