Imprint Apparatus Alignment Control for Light Irradiation
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Solution Overview
Problem
Changes in light irradiation conditions affect the alignment between a substrate and a mold in the imprint technique, leading to variations in the pattern formation of a curable composition, which can result in alignment errors and decreased yield.
Innovation Solution
An imprint apparatus with an alignment mechanism, a curing device, and a controller that adjusts the alignment control information based on changes in light irradiation conditions, using a mold deformation mechanism and alignment measurement device to maintain accurate alignment by compensating for irradiation-induced errors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the irradiation condition of light with respect to the curable composition changes, then the curing process can be optimized, but the alignment result between the substrate and the mold changes
Solution Approach 1:
The system performs preliminary measurement of the curable composition's properties before the imprinting process. Based on this preliminary data, the controller pre-calculates and sets appropriate alignment correction values, ensuring that when the actual imprinting occurs with specific light irradiation conditions, the alignment is already optimized to compensate for any irradiation-induced changes.
Solution Approach 2:
The system incorporates a feedback mechanism where the actual alignment result is measured after the imprinting process. The controller compares this actual result with the target alignment and automatically adjusts the alignment correction values for subsequent processes. This closed-loop feedback ensures that any irradiation condition changes are continuously compensated for, maintaining consistent alignment precision.
2Productivity
If the irradiation condition of light changes, then the curing efficiency can be improved, but alignment errors increase
Solution Approach 1:
The alignment correction values are made dynamic rather than fixed. The system continuously adapts the alignment correction based on the actual light irradiation conditions used during curing. When curing efficiency is optimized by changing irradiation parameters, the system dynamically adjusts the alignment correction values to compensate for any resulting alignment shifts, allowing both high productivity and high precision to coexist.
Solution Approach 2:
The system changes the alignment correction parameter in response to changes in the light irradiation parameter. By establishing a relationship between irradiation conditions and alignment results, the controller adjusts the alignment correction values as a function of the irradiation parameters, enabling the system to maintain alignment accuracy while optimizing curing efficiency through parameter coordination.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively reduces alignment errors caused by changes in light irradiation conditions, ensuring consistent pattern formation and improving the yield by dynamically adjusting the alignment control in response to variations in illuminance and exposure conditions.
Implementation Method 1
a curing device configured to cure the curable composition between the shot region and the pattern region by irradiating the curable composition with light
Data Source
AI summary
An imprint apparatus that forms a pattern of a curable composition on a substrate by using a mold, includes an alignment mechanism configured to perform alignment between a shot region of the substrate and a pattern region of the mold, a curing device configured to cure the curable composition between the shot region and the pattern region by irradiating the curable composition with light, and a controller configured to change control information of the alignment by the alignment mechanism in accordance with a change of an irradiation condition of light by the curing device.