Imprint Alignment Using Mold-Side Marks in Deficient Shots
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Solution Overview
Problem
Existing imprint apparatuses face challenges in accurately aligning patterns in deficient shot regions due to incomplete substrate-side marks, leading to inaccuracies in position and shape determination.
Innovation Solution
The apparatus employs a mold holding unit, a movable substrate stage, a detecting unit, and a controller to perform die-by-die alignment in normal shot regions and global alignment in deficient shot regions, using multiple length measuring systems to ensure precise positioning and alignment even in areas with missing marks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If die-by-die alignment is performed using substrate-side marks in deficient shot regions, then alignment can be performed in these regions, but alignment accuracy deteriorates because substrate-side marks are incomplete or missing
Solution Approach 1:
The patent introduces mold-side marks as an intermediary reference that mediates between the mold and substrate positioning. These marks are formed on the mold itself rather than requiring complete substrate-side marks, enabling alignment in deficient shot regions where substrate-side marks are incomplete or missing.
Solution Approach 2:
The alignment system is segmented into two independent mark systems: mold-side marks and substrate-side marks. This segmentation allows the system to use whichever mark system is available or reliable in each specific shot region, so that deficient shot regions can rely on mold-side marks while normal shot regions can use substrate-side marks for high-precision die-by-die alignment.
2Measurement precision
If global alignment is performed using length measuring units, then alignment accuracy in deficient shot regions is improved, but device complexity increases due to additional measuring systems
Solution Approach 1:
The alignment system dynamically selects between die-by-die alignment mode (using substrate-side marks) and global alignment mode (using mold-side marks and length measuring units) based on the shot region type. The controller determines whether each shot region is normal or deficient and automatically switches alignment methods accordingly, optimizing both accuracy and resource utilization.
Solution Approach 2:
The mold-side marks serve multiple functions: they act as reference marks for global alignment in deficient shot regions, and they also serve as fallback references when substrate-side marks are incomplete. This multi-functionality reduces the need for separate alignment systems while maintaining high accuracy across all shot region types.
3Device complexity
If only substrate-side marks are used for alignment, then device complexity is reduced, but alignment accuracy deteriorates in deficient shot regions where marks are missing
Solution Approach 1:
The system changes the reference parameter for alignment based on shot region characteristics. In normal shot regions, it uses substrate-side marks with die-by-die alignment for high precision. In deficient shot regions, it switches to using mold-side marks with global alignment, changing the alignment parameters and methods to match the available information and maintain manufacturing precision.
Data Source
AI summary
The imprint apparatus according to the present invention includes a mold holding unit configured to be movable with holding a mold, a moving body configured to be movable with holding a substrate, a detecting unit configured to detect a position of mold-side marks formed in a pattern region of the mold and a position of substrate-side marks formed in a shot region on the substrate, a measuring unit configured to measure a relative position between the mold holding unit and the moving body, and a controller configured to control a movement of the moving body based on a result of the detection by the detecting unit when an imprint process is performed in a normal shot region, and to control the movement of the moving body based on a result of the measurement by the measuring unit when the imprint process is performed in a deficient shot region.