Imprint Alignment Unit Mark Detection Abnormality Correction
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Solution Overview
Problem
Existing imprint apparatuses face challenges in maintaining alignment accuracy due to alignment-mark detection faults caused by foreign particles between mold-side and substrate-side marks, leading to measurement errors and decreased alignment precision.
Innovation Solution
An imprint apparatus is designed with an alignment unit that detects positional deviations in multiple mark pairs and determines abnormal mark detection by calculating a determination value, allowing for correction of positional deviations and shape differences to improve alignment accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If optical detection of alignment marks is used to achieve alignment between mold and substrate, then alignment can be performed, but foreign particles between marks cause detection faults and measurement errors, decreasing alignment accuracy
Solution Approach 1:
The patent applies local quality by examining each mark pair's detection result individually and identifying abnormal local deviations caused by foreign particles. By analyzing positional deviation information from multiple mark pairs and identifying outliers, the system can locally correct or exclude affected measurements while maintaining overall alignment accuracy.
Solution Approach 2:
The patent implements feedback by using detection results from multiple mark pairs to verify and correct alignment measurements. The system compares positional deviation information across different mark pairs, identifies inconsistencies caused by foreign particles, and uses valid measurements to correct or compensate for erroneous ones, ensuring reliable alignment accuracy.
2Reliability
If multiple mark pairs are used to improve alignment reliability, then detection robustness increases, but processing complexity and determination value calculation increase
Solution Approach 1:
The patent applies segmentation by dividing the alignment verification process into distinct steps: obtaining positional deviation information from multiple mark pairs, comparing these deviations, determining abnormal values, and correcting or excluding affected measurements. This segmented approach manages complexity by breaking down the verification process into systematic, manageable operations.
Solution Approach 2:
The patent uses parameter changes by analyzing positional deviation information as a quantitative parameter across multiple mark pairs. By establishing determination values based on statistical analysis of these parameters and comparing against allowable ranges, the system automatically identifies and corrects abnormal detections, managing complexity through parameter-based decision making.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively reduces the influence of abnormal mark detection on alignment accuracy, enhancing the precision of pattern formation on substrates by correcting positional deviations and shape differences within allowable ranges.
Implementation Method 1
a mold-side mark provided on the mold and a substrate-side mark provided on the substrate are optically detected
Implementation Method 2
light, such as ultraviolet light, is radiated thereon to cure the light-curable resin
Data Source
AI summary
An imprint apparatus for forming a pattern on an imprinting material includes an alignment unit that detects a mold-side mark formed on a mold and a substrate-side mark formed on the substrate, forming a mark pair, and aligns the mold and the substrate on the basis of a detection result. The alignment unit obtains, by using the detection result of a first mark pair and the detection result of a second mark pair, which is different from the first mark pair, positional deviation information of the first mark pair and positional deviation information of the second mark pair in the same direction; obtains a determination value by using the positional deviation information of the first mark pair and the positional deviation information of second mark pair; and determines that mark detection is abnormal when the determination value is not in an allowable range.