Imprint Apparatus Alignment Mark Selection
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Solution Overview
Problem
The die-by-die alignment method in imprint processes often fails to correctly detect alignment marks due to foreign matter, surface peeling, or erroneous user registration, leading to alignment errors and reduced productivity in semiconductor device mass production.
Innovation Solution
An imprint apparatus equipped with multiple TTM scopes for simultaneous observation and measurement of alignment marks on both the mold and substrate, allowing for pre-process mark observation to select optimal marks and correct positional deviations, ensuring accurate alignment and preventing rework.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the die-by-die alignment method is used during the imprint process, then alignment accuracy is improved, but the risk of detection abnormalities increases due to foreign matter, surface peeling, or erroneous mark registration
Solution Approach 1:
The patent applies preliminary action by performing mark detection before the imprint process begins. The system detects alignment marks on the substrate in advance, validates their positions and patterns, and confirms detectability under actual imaging conditions. This preliminary detection prevents detection abnormalities during the imprint process, ensuring both high alignment accuracy and reliable mark detection throughout production.
2Manufacturing precision
If alignment mark detection is performed during the imprint process, then alignment precision is maintained, but productivity decreases due to rework when abnormalities occur
Solution Approach 1:
The system performs preliminary mark detection and validation before the imprint process, identifying and correcting any detection abnormalities in advance. This prevents mid-process failures that would require substrate rework, thereby maintaining both high alignment precision and continuous production throughput without interruptions.
Solution Approach 2:
The patent implements feedback by using the preliminary detection results to adjust and optimize the imprint process parameters. The system feeds back the detected mark positions and patterns to verify alignment accuracy, and makes real-time corrections if deviations are found, ensuring continuous high-precision alignment while maintaining productivity.
3Manufacturing precision
If multiple alignment marks are used for each shot region, then alignment accuracy is improved, but the complexity of mark selection and management increases
Solution Approach 1:
The system applies self-service by automatically selecting optimal alignment marks from multiple candidates in each shot region based on predetermined selection criteria. The mark selection unit autonomously evaluates mark positions, patterns, and detectability, then selects the most suitable marks without requiring manual intervention. This automation maintains high alignment accuracy while significantly reducing the operational complexity of mark management.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances alignment accuracy, reduces rework, and improves productivity by detecting alignment mark abnormalities before the imprint process, thereby maintaining high precision and efficiency in mass production.
Implementation Method 1
a scope that measures a relative positional deviation amount between the mold and the substrate
Data Source
AI summary
To reduce the occurrence of rework in the imprint process, an imprint apparatus that executes an imprint process of forming a pattern to an imprint material on a substrate using a mold includes an observation unit configured to observe a plurality of marks formed on the mold, and a control unit configured to select the marks to be used in the imprint process based on positions of the marks on the mold, cause the observation unit to observe the selected marks before the imprint process is executed, and determine whether or not the imprint process is executable, based on an observation result.