Imprint Lithography Alignment Optics for Template Mark Positioning
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Solution Overview
Problem
Existing alignment technologies for imprint lithography struggle to accurately align imprint templates with varying alignment mark positions, which can lead to misalignment issues during the patterning process.
Innovation Solution
An alignment apparatus comprising at least two detectors and alignment radiation adjustment optics that can adjust the locations of alignment radiation beams to detect and align imprint template marks at different positions, allowing for precise alignment with the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a fixed alignment apparatus is used, then the alignment process is simple, but it cannot accommodate imprint templates with alignment marks at different positions
Solution Approach 1:
The alignment apparatus employs adjustable alignment radiation adjustment optics that can dynamically change the locations from which detectors receive alignment radiation. This dynamic adjustability allows the system to accommodate alignment marks at different positions on various imprint templates while maintaining a relatively simple overall device structure.
2Measurement precision
If alignment radiation beams are fixed in location, then the device structure is simple, but alignment precision varies with template design
Solution Approach 1:
The alignment apparatus is designed with multi-functional alignment radiation adjustment optics that can serve multiple alignment mark positions. This universal design allows a single apparatus structure to achieve precise alignment measurements for different template designs by adjusting the radiation beam locations rather than requiring separate fixed apparatus for each template type.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables accurate alignment of imprint templates with varying alignment mark positions, ensuring precise patterning and minimizing misalignment, thereby improving the efficiency and reliability of the imprint lithography process.
Implementation Method 1
alignment radiation adjustment optics configured to provide adjustment of locations from which the at least two alignment detectors receive alignment radiation
Implementation Method 2
at least two detectors which are configured to detect an imprint template alignment mark
Data Source
AI summary
An imprint lithography alignment apparatus is disclosed that includes at least two detectors which are configured to detect an imprint template alignment mark, wherein the alignment apparatus further comprises alignment radiation adjustment optics which are configured to provide adjustment of locations from which the at least two alignment detectors receive alignment radiation.