Imprint Alignment Control Using Multi-Scope Data Filtering
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Solution Overview
Problem
Conventional imprint apparatuses face challenges in accurately aligning a mold with a substrate due to incorrect information from alignment scopes, often resulting in low accuracy caused by mark deformation, uneven thickness, and foreign particles, which are not effectively filtered out.
Innovation Solution
The imprint apparatus employs a control unit that utilizes multiple alignment scopes to output information on the relative position of marks on the substrate and mold, excluding incorrect data to ensure precise alignment, using techniques such as moire signal processing and Fourier transforms to identify and remove erroneous information.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Difficulty of detecting and measuring
If multiple alignment scopes are used to detect relative positions of mark pairs, then the coverage and detection capability are improved, but the reliability of alignment information deteriorates due to incorrect information from mark deformation, uneven thickness, and foreign particles
Solution Approach 1:
The system implements feedback by comparing alignment information from multiple alignment scopes and using statistical processing to identify and eliminate incorrect information. The control unit analyzes the consistency of detection results across multiple scopes and mark pairs, feeding back corrected alignment information that excludes data affected by mark deformation, uneven thickness, or foreign particles.
Solution Approach 2:
The system changes the parameter of information processing by applying statistical methods to evaluate and filter alignment data. By analyzing the distribution and consistency of detection results across multiple alignment scopes, the system identifies outliers and incorrect information, then uses the remaining valid data to determine final alignment parameters.
2Productivity
If alignment information from all mark pairs is used for control, then the productivity is improved, but the manufacturing precision deteriorates due to inclusion of incorrect information
Solution Approach 1:
The system applies statistical processing parameters to evaluate alignment information quality. By calculating statistical metrics such as standard deviation or consistency ratios across multiple mark pairs, the system automatically identifies and excludes incorrect information while maintaining efficient processing of valid data, thus preserving both productivity and precision.
Solution Approach 2:
The control unit implements feedback control by continuously monitoring the quality of alignment information from multiple alignment scopes. When incorrect information is detected through statistical analysis, the system adjusts the alignment control by excluding problematic data points and using only validated information, ensuring high precision without sacrificing processing efficiency.
3Device complexity
If conventional alignment processing is used without filtering, then the device complexity is kept low, but the measurement precision deteriorates due to incorrect information affecting alignment control
Solution Approach 1:
The control unit implements a feedback-based filtering mechanism that automatically evaluates and excludes incorrect alignment information. By comparing detection results across multiple alignment scopes and mark pairs, the system identifies inconsistencies caused by mark deformation, uneven thickness, or foreign particles, and uses statistical processing to determine the most accurate alignment parameters without requiring complex additional hardware.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the accuracy of mold and substrate alignment by filtering out incorrect information, leading to improved precision and reliability in pattern formation on the substrate.
Implementation Method 1
information indicating a relative position of a first mark selected from a plurality of first marks in the shot region and a second mark selected from a plurality of second marks on the mold
Data Source
AI summary
An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a plurality of alignment scopes and a control unit. The control unit controls aligning of a shot region of the substrate and the mold based on outputs from the plurality of alignment scopes. Each of the plurality of alignment scopes outputs information indicating a relative position of a first mark selected from a plurality of first marks in the shot region and a second mark selected from a plurality of second marks on the mold. The control unit controls aligning of the shot region and the mold based on information excluding incorrect information from a plurality of pieces of information output from the plurality of alignment scopes.