Imprint Apparatus Alignment via Pre-calculated Shot Region Shapes
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Solution Overview
Problem
The die-by-die alignment method in imprint apparatuses often fails to accurately align molds and substrates due to insufficient marks in partial shot regions, leading to reduced productivity and overlay accuracy.
Innovation Solution
An imprint apparatus equipped with a detector to identify marks in fully formed shot regions, a deformation unit to adjust the mold pattern, and a controller to calculate and apply necessary deformations for aligning the mold with partial shot regions, ensuring accurate pattern transfer despite missing marks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If the die-by-die alignment method is used with marks formed only in the four corners of each shot region, then the alignment process is simple, but the alignment accuracy deteriorates in partial shot regions where not all marks are formed
Solution Approach 1:
The patent pre-calculates and stores the shapes of all shot regions before the imprint process. When performing imprint on partial shot regions, the system retrieves the pre-stored shape information to perform accurate alignment, eliminating the need to detect all marks during the actual alignment process.
Solution Approach 2:
The patent creates a virtual copy of the shot region shape by calculating it from detected marks and storing this shape information. This copied shape data is then used for alignment in partial shot regions where physical marks may be missing, allowing accurate alignment without requiring all original marks to be present.
2Manufacturing precision
If imprint process is performed only on complete shot regions where all marks are formed, then alignment accuracy is maintained, but productivity decreases due to unused partial shot regions
Solution Approach 1:
The patent pre-calculates the shapes of all shot regions including partial ones, and stores this information in advance. This allows the system to perform accurate alignment on partial shot regions during the imprint process without needing to detect all marks at that moment, thereby enabling utilization of previously unusable areas.
Solution Approach 2:
The patent changes the approach from requiring all physical marks to be present for alignment to using pre-calculated shape parameters. This parameter change enables the imprint process to be performed on partial shot regions where some marks may be missing, thus increasing the usable area of the substrate.
3Manufacturing precision
If marks are formed in all shot regions including partial regions, then alignment can be performed accurately, but the substrate area is wasted in regions where marks cannot be formed
Solution Approach 1:
The patent creates a virtual copy of the shot region shape by calculating it from detected marks and storing this shape information. This copied shape data serves as a substitute for physical marks in partial shot regions, enabling alignment without requiring marks to be formed in all regions including unusable edge areas.
Solution Approach 2:
The patent pre-calculates and stores shape information for all shot regions before the imprint process. This preliminary preparation allows the system to perform alignment on partial shot regions using stored shape data rather than requiring physical marks to be present, thereby maximizing substrate utilization.
Data Source
AI summary
An imprint apparatus performs an imprint process by which an imprint material on a substrate is molded using a mold having a pattern region. A detector detects marks formed in each of a plurality of shot regions on the substrate. The plurality of shot regions include a first region in which all of the marks to be formed in one shot region are formed, and a second region in which some of the marks to be formed in one shot region are formed. When performing the imprint process on the second shot region, a controller obtains a shape of the second shot region based on a shape of the first shot region obtained by detecting the marks formed in the first shot region, and an amount of deformation of the pattern region by the deformation unit by using the obtained shape of the second shot region.