Imprint Apparatus Concurrent Position and Shape Control
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Solution Overview
Problem
Existing imprint techniques face challenges in achieving accurate overlay and shape matching between molds and substrates due to interference between position correction and shape correction processes, which affects productivity and pattern transfer quality.
Innovation Solution
An imprint apparatus equipped with a measurement unit for position data, a driving unit for both mold and substrate, and a control unit that concurrently controls relative positions and shape deformation using time-series data to optimize alignment and shape matching during the imprint process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If position correction and shape correction are performed in the same time zone between mold contact and release, then productivity is improved, but overlay accuracy deteriorates due to mutual interference between correction operations
Solution Approach 1:
The patent segments the correction operations into distinct phases: position correction is performed before mold contact, while shape correction is performed after mold contact but before release. This temporal segmentation eliminates mutual interference between the two correction operations, maintaining overlay accuracy while preserving productivity benefits through continuous operation.
2Productivity
If correction operations are performed concurrently to increase productivity, then output per unit time is improved, but correction precision deteriorates due to operational interference
Solution Approach 1:
The patent performs position correction as a preliminary action before the mold contacts the imprint material. This ensures that position alignment is established and stabilized before shape correction begins, preventing interference between the two correction operations and maintaining high correction precision while enabling continuous processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances overlay accuracy and productivity by minimizing interference between position and shape correction processes, ensuring precise pattern transfer and improved substrate-mold alignment.
Implementation Method 1
a measurement unit configured to obtain position data by measuring relative positions of the mold and the substrate
Implementation Method 2
a technique of generating a heat distribution by irradiating a mold and a substrate with light, and controlling expansion of the mold and substrate for each region
Data Source
AI summary
The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate by using a mold, the apparatus including a control unit configured to control a driving unit and a deformation unit such that parts of position control of controlling the relative positions of the mold and the substrate, and shape control of deforming at least one of the mold and the substrate are performed concurrently, wherein the control unit includes an input unit configured to give, to target position data, time-series data representing relative positions of the mold and the substrate that change at each time during which the shape control is performed in accordance with deformation in at least one of the mold and the substrate by the deformation unit.