Imprint Apparatus Real-Time Contact Detection for Curing Timing

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Solution Overview

Problem

In the imprinting method for semiconductor devices and MEMS, the timing of irradiating curing light to prevent the imprint material from protruding outside the pattern area is challenging due to variations in the spread of the imprint material, which depends on surface conditions, material supply, and viscosity characteristics, leading to inconsistent curing.

Innovation Solution

An imprint apparatus equipped with a detection unit to monitor the contact state and a light modulation element to control the intensity distribution of irradiation light, allowing for precise timing of light irradiation based on real-time detection results to prevent protrusion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the imprint material is irradiated with curing light at a predetermined timing to prevent protrusion, then the pattern transfer reliability is improved, but the curing consistency deteriorates due to variations in material spread

Engineering Contradiction:
Improvepattern transfer reliabilityVSAvoidcuring consistency
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The system uses a detection unit to monitor the actual contact state between the imprint material and mold in real-time, then feeds this information back to the control unit which adjusts the light irradiation timing accordingly. This closed-loop feedback mechanism ensures that curing occurs at the optimal moment for each specific case, maintaining both reliability and consistency despite variations in material spread.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The invention transitions from a static, predetermined light irradiation timing to a dynamic timing that adapts to actual process conditions. The detection unit continuously monitors the contact state, and the control unit dynamically adjusts the irradiation timing based on real-time feedback, allowing the system to respond to variations in material spread, viscosity, and surface conditions.

Inventive Principle:
Principle #15Dynamics

2Manufacturing precision

If the imprint material is allowed to spread freely to fill the space between mold and substrate, then the pattern filling is improved, but the material protrusion outside the shot region increases

Engineering Contradiction:
Improvepattern filling qualityVSAvoidmaterial protrusion
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The detection unit monitors the contact state in advance to determine the optimal timing for light irradiation. By detecting when the imprint material has sufficiently filled the space between the mold and substrate, the system can apply curing light at the precise moment before protrusion occurs, ensuring complete pattern filling while preventing material waste outside the shot region.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution ensures accurate and consistent curing of the imprint material, preventing it from protruding outside the pattern area by adjusting the irradiation timing and intensity distribution, thereby improving the reliability of pattern transfer onto the substrate.

Implementation Method 1

a detection unit configured to detect a contact state of the imprint material on the substrate with the mold

Methodology Applied
Scientific EffectOptical detection: Reflection

Implementation Method 2

the imprint material is irradiated with curing light such as ultraviolet light in a state where the imprint material fills a space between the mold and the substrate, so that the imprint material is cured

Methodology Applied
Scientific EffectPhoto-curing: Photopolymerisation

Data Source

PatentUS11656547B2Imprint apparatus, imprinting method, and product manufacturing method
Publication Date: 2023.05.23 CANON KK
  • US11656547B2 patent drawing
  • US11656547B2 patent drawing
  • US11656547B2 patent drawing

AI summary

An imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold including a pattern formation area, the imprint apparatus includes a detection unit configured to detect a contact state of the imprint material on the substrate with the mold, a light modulation element configured to control an intensity distribution of irradiation light irradiating the substrate, and a control unit configured to control a timing of irradiating the substrate with the irradiation light having the intensity distribution controlled by the light modulation element based on a detection result of the detection unit.