Imprint Apparatus Residual Layer Uniformity via Contact Timing

The patent applies local quality by dividing the mold into multiple regions and setting different supply timings for each region. The controller identifies early-contact regions and late-contact regions based on substrate topography, then selectively supplies imprint material to specific regions at different times. This localized differentiation of supply timing compensates for the nonuniform contact timing across the mold surface, maintaining uniform residual layer thickness while enabling multi-area collective imprinting.

The patent implements preliminary action by pre-calculating the contact timing for each region of the mold before the imprinting process. The controller uses measured substrate topography data to determine which regions will contact the mold early and which will contact later, then pre-establishes the supply timing pattern accordingly. This preliminary planning allows the system to compensate for topography variations without requiring complex real-time adjustments during the actual imprinting process.