Imprint Apparatus Optical Path Integration for Pattern Precision
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Solution Overview
Problem
Existing imprint apparatuses lack a suitable configuration for combining a deforming unit that thermally deforms a region on a substrate using light illumination with an observing unit that observes the region, as described in Japanese Patent Laid-Open No. 2013-102132 does not provide a comprehensive solution for this integration.
Innovation Solution
An imprint apparatus that includes a deforming unit for thermal deformation using light illumination and an observing unit with a light source and receiving unit, combined by an optical element to guide both lights to the region, allowing for precise observation and thermal shaping of the pattern region on a substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a deforming unit and an observing unit are used together in an imprint apparatus, then the precision of pattern formation and observation is improved, but the device complexity increases due to the need to combine multiple optical systems
Solution Approach 1:
The patent combines the optical system for observing the pattern region and the optical system for thermal deformation into a single integrated optical system. This merging approach allows both observation and heating functions to share common optical components such as lenses and mirrors, thereby reducing overall system complexity while maintaining the ability to perform both functions with high precision
Solution Approach 2:
The patent designs optical components that serve multiple functions - the same optical system is used for both observing the pattern region (imaging function) and for delivering thermal deformation light (heating function). This multi-functionality reduces the number of separate components needed and simplifies the overall device structure while achieving both observation and thermal shaping goals
2Measurement precision
If separate optical systems are used for observation and thermal deformation, then each function can be optimized independently, but the alignment accuracy between the two systems deteriorates
Solution Approach 1:
By merging the observation optical system and thermal deformation optical system into a single integrated system, the patent ensures that both functions share the same optical path and focal plane. This eliminates alignment errors between separate systems and ensures that observation and heating are precisely co-located, thereby maintaining both high observation accuracy and high overlay precision
3Adaptability or versatility
If multiple separate units are used for observation and deformation, then functional versatility is improved, but the device size increases
Solution Approach 1:
The patent merges multiple functional units (observation unit and thermal deformation unit) into a single integrated apparatus that shares common components such as optical paths, lenses, and control systems. This consolidation maintains the functional versatility of performing both observation and thermal deformation while significantly reducing the overall apparatus size by eliminating redundant components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise formation of patterns on a substrate by combining thermal deformation and observation functions, improving overlay precision and reducing shape differences between the mold pattern and the substrate pattern, thus enhancing the accuracy of pattern formation.
Implementation Method 1
a light source which emits first light and a receiving unit which receives the first light which is emitted from the light source, is reflected by the region to be processed, and passes through the mold
Implementation Method 2
a deforming unit configured to thermally deform the region to be processed by illumination with second light
Data Source
AI summary
An imprint apparatus which forms a pattern of an imprint material in a region to be processed on a substrate by using a mold includes an observing unit configured to include a light source which emits first light and a receiving unit which receives the first light which is emitted from the light source, is reflected by the region to be processed, and passes through the mold; a deforming unit configured to thermally deform the region to be processed by illumination with second light; and a combining member which combines the first light of the light source and the second light from the deforming unit and guides the first light and the second light to the region to be processed.