Imprint Apparatus Resin Curing Feedback Control
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Solution Overview
Problem
Current nanoimprint technologies face challenges in achieving high accuracy for transferring fine patterns onto substrates, particularly due to issues with resin material curing and positional control during the imprint process.
Innovation Solution
An imprint apparatus equipped with a light source, a measuring device to monitor optical characteristics and physical changes in the resin material, and a controller to adjust light intensity and spatial positioning based on real-time measurements, ensuring precise curing and pattern transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If light irradiation is applied to cure the resin material, then the pattern transfer is enabled, but the resin material volume changes causing distance and load variations that reduce imprint accuracy
Solution Approach 1:
The patent employs a measuring device to detect physical values (distance, load, optical characteristics) of the resin material during light irradiation, and a controller adjusts light irradiation parameters based on this feedback to maintain stable resin material state and ensure high imprint accuracy
Solution Approach 2:
The patent dynamically adjusts light irradiation parameters (intensity, duration) based on real-time measurements of resin material physical values, changing parameters to compensate for volume changes and maintain optimal curing conditions
2Manufacturing precision
If the mold is pressed against the substrate to transfer the pattern, then the pattern fidelity is improved, but stress and deformation occur during the process
Solution Approach 1:
The patent applies light irradiation in controlled periods with measurement and adjustment cycles, allowing gradual curing that reduces sudden stress buildup while maintaining pattern fidelity
Solution Approach 2:
The controller adjusts light irradiation parameters dynamically to control the curing rate, changing parameters to maintain optimal pressure and minimize stress and deformation during pattern transfer
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances imprint accuracy by controlling light exposure and positional relationships, allowing for uniform curing and reduced stress on the mold, resulting in improved pattern fidelity and reduced deformation.
Implementation Method 1
a light source for irradiating the resin material with light for curing the resin material
Data Source
AI summary
An imprint apparatus for imprinting a pattern formed on a mold in a resin material formed on a substrate with accuracy is constituted by a light source for irradiating the resin material with light for curing the resin material; a measuring device for measuring a physical value which reflects a state of the resin material resulting from the irradiation of light from the light source; and a controller for controlling a spatial positional relationship between the mold and the substrate or an amount of light from the light source on the basis of information obtained from the measuring device.