Imprint Apparatus Map-Based Supply Position Adjustment
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Solution Overview
Problem
In imprint apparatuses, users face difficulties in grasping the precise positions of imprint material supply on a substrate, especially when finely adjusting supply positions based on a map, leading to potential defects due to insufficient or excessive material distribution.
Innovation Solution
An imprint apparatus with a control unit that provides a user interface displaying a first map for initial supply positions and an adjustment window for modifying apparatus parameters, generating a second map showing adjusted supply positions, allowing users to easily check and adjust the array pattern of the imprint material on the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If apparatus parameters are adjusted to change imprint material supply positions, then the flexibility and precision of material distribution is improved, but the user's ability to grasp the supply positions deteriorates
Solution Approach 1:
The patent creates a visual map that copies and represents the actual supply positions on the substrate. This map serves as an information copy that allows users to grasp the supply positions without directly observing the physical substrate, thereby resolving the contradiction between precise parameter adjustment and visibility of positions.
Solution Approach 2:
The patent introduces a map as an intermediary between the apparatus parameters and the supply positions. This intermediary visual representation mediates the information gap, allowing users to understand the effect of parameter adjustments without losing the precision of the actual supply positions.
2Ease of operation
If a map is used to indicate supply positions, then the ease of grasping positions is improved, but the ability to perform fine adjustments deteriorates
Solution Approach 1:
The patent merges the map display with the parameter adjustment interface into a single integrated system. The map and adjustment controls work together as a unified interface, allowing users to perform fine adjustments while continuously viewing the updated supply positions on the map, thereby combining ease of grasping positions with adjustment capability.
Solution Approach 2:
The patent implements real-time feedback by updating the map display as parameters are adjusted. This feedback loop allows users to immediately see the effect of their adjustments on the supply positions, making the adjustment process intuitive and reducing the complexity of operating the system.
3Productivity
If apparatus parameters are changed to supply material at intervals smaller than map-designated positions, then the productivity is improved, but the manufacturing precision deteriorates
Solution Approach 1:
The patent makes the supply interval dynamic by allowing it to be adjusted through apparatus parameters while maintaining the underlying map structure. The system can adaptively change the supply intervals based on pattern density and other conditions, enabling both high productivity through reduced intervals and maintained precision through parameter control.
Solution Approach 2:
The patent utilizes parameter changes to achieve variable supply intervals. By adjusting apparatus parameters such as supply frequency or speed, the system can supply material at smaller intervals than the original map designations while maintaining precision through controlled parameter modification rather than random variation.
Data Source
AI summary
The present invention provides an imprint apparatus which forms a pattern of an imprint material onto a substrate by using a mold, the apparatus including a control unit configured to provide a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter which is set in the imprint apparatus and used to change a supply position of the imprint material, and a second map indicating a supply position of the imprint material after adjustment of the value of the apparatus parameter.