Imprint Apparatus Dynamic Control Gain Adjustment

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Solution Overview

Problem

The existing imprint techniques face challenges in achieving high-definition micro processing at the nanometer scale due to alignment accuracy issues, particularly because the viscosity change of the imprint material during alignment leads to increased resisting forces, making it difficult to control the alignment process efficiently.

Innovation Solution

The method involves increasing the viscosity of the imprint material by irradiating it with light while it is in contact with the mold, and simultaneously adjusting the control gain used in the controller to align the substrate and mold, allowing for precise positioning and curing of the imprint material.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the imprint material is irradiated with light to increase viscosity during alignment, then alignment accuracy is improved, but the resisting force increases making alignment slower

Engineering Contradiction:
Improvealignment accuracyVSAvoidalignment speed
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The control gain is dynamically adjusted during the alignment process. Initially, a higher control gain is used to achieve rapid alignment when the imprint material has low viscosity. As the alignment progresses and viscosity increases, the control gain is reduced to accommodate the increased resisting force, preventing overshoot and enabling fine positional adjustments. This dynamic adjustment resolves the contradiction by adapting the control parameters to the changing viscosity conditions throughout the alignment process.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The invention changes the control parameter (control gain) based on the viscosity state of the imprint material. By monitoring or estimating the viscosity changes during alignment and adjusting the control gain accordingly, the system optimizes both alignment speed and accuracy. This parameter adaptation allows the alignment system to handle the transitioning viscosity conditions effectively.

Inventive Principle:
Principle #35Parameter changes

2Device complexity

If a fixed control gain is used for alignment, then the control system is simple, but it cannot adapt to viscosity changes resulting in prolonged alignment time

Engineering Contradiction:
Improvecontrol system complexityVSAvoidalignment time
Core Design Contradiction:
Device complexityVSLoss of time

Solution Approach 1:

The control gain transitions from a fixed value to a dynamically adjustable parameter. The system incorporates a control gain adjustment mechanism that modifies the gain value during the alignment process based on viscosity changes. This dynamic approach increases control system capability while managing the complexity through systematic parameter adaptation rather than complex multi-component systems.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The alignment system incorporates feedback mechanisms to monitor the alignment progress and viscosity changes, then adjusts the control gain accordingly. This feedback loop enables the system to respond to changing conditions in real-time, optimizing alignment time while maintaining adaptability through controlled complexity.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the alignment accuracy and reduces the time required for alignment by increasing the control gain in response to the increased viscosity, resulting in improved transfer accuracy and efficiency in forming patterns on the substrate.

Implementation Method 1

irradiating the imprint material with light to increase a viscosity of the imprint material on the substrate

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS11413793B2Imprint apparatus, imprint method, and method for manufacturing product
Publication Date: 2022.08.16 CANON KK
  • US11413793B2 patent drawing
  • US11413793B2 patent drawing
  • US11413793B2 patent drawing

AI summary

An imprint method for forming a pattern of an imprint material on a substrate includes irradiating the imprint material with light to increase a viscosity of the imprint material on the substrate with a mold and the imprint material being in contact with each other, aligning the substrate and the mold with each other while changing and increasing a control gain to be used in a controller, which is configured to control relative positions of the mold and the substrate so as to reduce a displacement based on a result of detection of the displacement between the substrate and the mold, in such a manner that the control gain increases with the mold and the imprint material being in contact with each other, and curing the imprint material by irradiating the imprint material with light.