Imprint Apparatus Controller for Parallel Substrate Processing
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Solution Overview
Problem
In imprint apparatuses with multiple processing devices, variations in overlay precision occur due to manufacturing and control errors, leading to differences in substrate-to-substrate consistency for regions at the same positions on substrates.
Innovation Solution
An imprint apparatus with a controller that coordinates multiple processing devices to perform imprint processes on substrates in parallel, ensuring uniformity by assigning corresponding regions across substrates and adjusting for differences in shape and position, using a cluster-type configuration with a conveying system and correction devices for precise mold alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple processing devices are used to perform imprint processes in parallel, then productivity is improved, but manufacturing precision deteriorates due to variations in overlay precision
Solution Approach 1:
The substrate processing is segmented into multiple regions, with each processing device assigned to specific regions. The controller coordinates multiple processing devices to work in parallel on different regions of the same substrate or on different substrates, thereby increasing throughput while maintaining precision through specialized assignment of devices to regions.
Solution Approach 2:
The system employs a controller that monitors and adjusts the operations of multiple processing devices in real-time. By implementing feedback control, the system compensates for variations in overlay precision among different processing devices, ensuring uniform quality across all substrates processed in parallel.
2Manufacturing precision
If a single processing device performs imprint processes for multiple regions in a single substrate, then manufacturing precision is maintained, but productivity deteriorates
Solution Approach 1:
The substrate is divided into multiple regions that can be processed simultaneously by different processing devices. Each device handles specific regions, allowing parallel processing of multiple regions within a single substrate, thereby increasing throughput while maintaining precision through consistent device performance on assigned regions.
Solution Approach 2:
Multiple processing devices are configured with similar capabilities to perform the same imprint process on different regions. This multi-functionality allows the system to distribute workload across devices while maintaining uniform processing quality, achieving both high throughput and consistent precision.
3Ease of operation
If different processing devices are used for central and peripheral regions of a substrate, then ease of operation is improved, but manufacturing precision deteriorates due to position-dependent variations
Solution Approach 1:
The system assigns specific processing devices to specific regions (central or peripheral) based on their performance characteristics. Each processing device is optimized for its assigned region, and the controller coordinates these devices to ensure uniform overlay precision across all regions by compensating for position-dependent variations through feedback control.
Data Source
AI summary
The present invention provides an imprint apparatus comprising a plurality of processing devices configured to perform imprint processes for a plurality of substrates in parallel, and a controller configured to control the plurality of processing devices, wherein the controller is configured to control the plurality of processing devices so that each of the plurality of processing devices performs imprint processes for a plurality of regions whose positions correspond to each other over the plurality of substrates, and so that the plurality of processing devices respectively perform imprint processes for a plurality of regions whose positions are different from each other and which have shapes corresponding to each other in a single substrate.