Imprint Method Multi-Step Curing Alignment Accuracy
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Solution Overview
Problem
The existing imprint techniques face challenges in improving alignment accuracy between the substrate's shot region and the mold's pattern region due to relative vibration and shape differences, which leads to protrusion of the imprint material and affects the precision of the pattern formation.
Innovation Solution
The method involves a multi-step light irradiation process, including a frame exposure step to suppress protrusion, a preliminary exposure step to reduce alignment errors, and a main exposure step to fully cure the imprint material, using different light sources and conditions in each step to enhance alignment accuracy and prevent material intrusion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the substrate and mold are supported by independent positioning mechanisms, then the imprint apparatus can operate with flexible positioning, but relative vibration between substrate and mold occurs which hinders alignment accuracy
Solution Approach 1:
The patent applies preliminary action by performing a first curing step before the main imprint process. The resist is partially cured in advance while still attached to the substrate, creating a rigidified frame structure that suppresses vibration during subsequent alignment operations, thus resolving the contradiction between positioning flexibility and alignment accuracy
Solution Approach 2:
The curing process is segmented into multiple stages: a first curing step that partially cures the resist frame region, followed by alignment operations, then a second curing step that completes the curing. This segmentation allows the resist to provide structural support during alignment while maintaining the ability to perform precise positioning operations
2Adaptability or versatility
If there is a shape difference between the shot region of the substrate and the pattern region of the mold, then the imprint process can accommodate different geometries, but alignment accuracy between substrate and mold deteriorates
Solution Approach 1:
The resist is preliminarily cured in the frame-shaped region before alignment, creating a rigid structural framework. This pre-cured frame serves as a stable reference structure that maintains the shot region geometry while providing vibration suppression, enabling accurate alignment even when the substrate shot region and mold pattern region have different shapes
Solution Approach 2:
The patent applies local quality by selectively curing only the frame-shaped peripheral region of the resist in the first curing step, while leaving the central region uncured. This creates a rigid border structure that provides alignment stability without constraining the overall geometry mismatch between substrate and mold
3Manufacturing precision
If the imprint material is irradiated with light to cure it, then the pattern formation is achieved, but the imprint material may protrude from the shot region during the process
Solution Approach 1:
The frame-shaped peripheral region of the resist is preliminarily cured before the main imprint and curing process. This pre-cured frame creates a rigid boundary structure that contains the uncured imprint material during pressing and subsequent curing, preventing protrusion while allowing complete pattern formation
Solution Approach 2:
The curing process is segmented into a first curing step that cures only the frame-shaped peripheral region, and a second curing step that cures the entire resist including the central region. This segmentation allows the frame to be formed as a containment structure before the bulk material is cured, preventing protrusion during the process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively improves alignment accuracy between the substrate and mold, reducing alignment errors and material protrusion, resulting in precise pattern formation and improved imprint quality.
Implementation Method 1
irradiating a frame-shaped portion of the imprint material on the shot region with light
Data Source
AI summary
An imprint method includes contact step of bringing imprint material on shot region of substrate and pattern region of mold into contact with each other, alignment step of aligning the shot region and the pattern region after the contact step, first irradiation step of, before the alignment step is completed, irradiating frame-shaped portion of the imprint material with light, second irradiation step, started after the first irradiation step is started, irradiating at least part of the imprint material on the shot region with light under condition different from condition in the first irradiation step so that alignment error between the shot region and the pattern region is reduced, third irradiation step of irradiating the entire imprint material on the shot region with light after the alignment step is completed.