Imprint Apparatus Detector Alignment Correction
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Solution Overview
Problem
The existing die-by-die alignment method in imprint apparatuses faces challenges in maintaining accurate alignment between substrate and mold due to detection errors caused by optical system aberration and illuminance unevenness, which affect the positioning of marks within the field of view.
Innovation Solution
An imprint apparatus with a detector system that adjusts its positioning based on driving amounts and correction values to ensure marks are within a specific field of view, using a controller to update these values for improved alignment accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If die-by-die alignment method is used to detect relative position between marks, then alignment can be performed for each shot region, but detection error changes due to optical system aberration and illuminance unevenness
Solution Approach 1:
The patent applies parameter changes by dynamically adjusting the field of view position based on detected mark positions and pre-stored correction values. The correction values compensate for optical aberrations and illuminance variations at different field of view positions, maintaining consistent detection accuracy across multiple shot regions.
Solution Approach 2:
The system implements feedback by detecting the actual position of marks, comparing them with expected positions, and using the detected positional information to adjust subsequent detection field of view positions. This closed-loop approach ensures that marks are consistently positioned within the optimal detection region, compensating for accumulated alignment errors.
2Adaptability or versatility
If marks are detected at different positions in the field of view, then coverage of multiple shot regions is achieved, but detection accuracy varies due to optical aberration and illuminance unevenness
Solution Approach 1:
The patent stores correction values for different field of view positions in advance, accounting for optical aberrations and illuminance variations. When detecting marks, the system selects and applies the appropriate correction value based on the current field of view position, ensuring consistent detection accuracy across the entire detection range.
Solution Approach 2:
The detection field is divided into multiple regions with different correction values. Each region has pre-calibrated correction data that compensates for local optical characteristics. This segmentation allows the system to maintain high detection accuracy across the entire field of view by applying region-specific corrections.
3Ease of manufacture
If alignment is performed based on detector output without correction, then processing is simple, but alignment accuracy deteriorates due to detection errors
Solution Approach 1:
The patent performs preliminary actions by pre-calculating and storing correction values for different field of view positions before actual alignment operations. This preparation work, though requiring initial setup, enables simple and accurate alignment operations during production by automatically applying the appropriate corrections based on current detection conditions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances alignment accuracy by minimizing detection errors and maintaining consistent measurement values, even with changes in optical characteristics and illuminance, thereby improving the overlay precision between substrate and mold patterns.
Implementation Method 1
a detector configured to detect a first mark provided in the substrate and a second mark provided in the mold
Data Source
AI summary
Imprint apparatus performs, on shot regions of substrate, imprint process for transferring pattern of mold to imprint material arranged on the substrate. The apparatus includes detector for detecting first mark of the substrate and second mark of the mold, and controller configured to control positioning of the detector based on driving amount, held in a storage, by which the detector is to be driven to fit the first mark and the second mark within specific region of field of view of the detector, and correction value held in the storage and used to correct the driving amount. The controller performs alignment between shot region selected from the shot regions and the mold based on output of the detector, and updates the correction value held in the storage based on the output of the detector.