Imprint Apparatus Discharge Position Measurement
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Solution Overview
Problem
Conventional imprint apparatuses require large and complex substrate stages due to the need for optical systems to accurately position the applying device, which can decrease accuracy and increase size, and direct detection of discharge openings is challenging due to potential attachment of solidified material and particles.
Innovation Solution
The imprint apparatus includes a measuring device that uses reference marks on the discharge surface to measure the position of discharge openings, eliminating the need for an image pickup apparatus on the substrate stage, thereby reducing size and weight, and allowing precise control of the applying device's position using a MEMS structure and scanning technology.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If an image pickup apparatus is provided on the substrate stage to image marks on the applying device, then the position of the applying device can be obtained, but the substrate stage becomes large and complex due to the need for optical systems
Solution Approach 1:
The invention extracts the measurement function from the substrate stage by providing the measuring device on the applying device holder instead. This separates the measurement system from the substrate stage, eliminating the need for optical systems on the substrate stage and reducing its complexity while maintaining measurement precision.
Solution Approach 2:
The invention introduces reference marks as an intermediary element on the discharge surface of the applying device. These reference marks serve as a mediator between the applying device and the measuring device, enabling position measurement without requiring the substrate stage to contain complex optical systems.
2Measurement precision
If an image pickup apparatus with illumination and detection optical systems is installed on the substrate stage, then the position of the applying device can be measured, but the size of the substrate stage increases
Solution Approach 1:
The invention extracts the measurement function from the substrate stage by providing the measuring device on the applying device holder instead. This separates the measurement system from the substrate stage, eliminating the need for optical systems on the substrate stage and reducing its complexity while maintaining measurement precision.
3Measurement precision
If direct imaging of discharge openings is attempted, then the position can be measured, but accuracy decreases due to solidified material and particles attaching to the discharge surface
Solution Approach 1:
The invention uses reference marks as a copy or proxy for the discharge openings. Instead of directly measuring the discharge openings which are contaminated by solidified material, the measuring device measures the reference marks which remain clean and stable, providing reliable position information that indirectly represents the discharge opening position.
Data Source
AI summary
An imprint apparatus that molds an imprint material on a substrate with a mold, the imprint apparatus including a applying device that includes a discharge surface in which a discharge opening is formed, the applying device applying the imprint material to the substrate through the discharge opening, and a measuring device that measures the position of the discharge opening by having the measuring device measure a position of an uneven structure formed in a protruded shape or a recessed shape with respect to a direction perpendicular to the discharge surface.