Imprint Apparatus Discharge Control for Pattern Uniformity

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Solution Overview

Problem

Existing imprint technologies face challenges in achieving accurate pattern formation due to inaccuracies in positioning and amount of imprint material on substrates, leading to defects and non-uniformity in pattern thickness.

Innovation Solution

An imprint apparatus with a movable stage, a supply portion for discharging imprint material, and a control unit that adjusts the discharge amount and timing based on property information to ensure the target amount of imprint material is accurately positioned on the substrate, using a correlation between discharge amount and position to correct deviations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the discharge amount of imprint material is adjusted to control pattern thickness, then the pattern thickness uniformity is improved, but the positioning accuracy of imprint material deteriorates

Engineering Contradiction:
Improvepattern thickness uniformityVSAvoidpositioning accuracy of imprint material
Core Design Contradiction:
Manufacturing precisionVSMeasurement precision

Solution Approach 1:

The patent implements feedback control by measuring the actual discharge amount of imprint material and using this information to adjust the discharge timing. The control unit modifies the timing based on the relationship between discharge amount and material velocity, ensuring that positioning accuracy is maintained even when discharge amount varies for thickness control

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent changes the timing parameter of material discharge based on the discharge amount. By adjusting the discharge timing in response to variations in discharge amount, the system maintains positioning accuracy while allowing discharge amount to be controlled for pattern thickness uniformity

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If the discharge timing is adjusted to correct positioning deviation, then the positioning accuracy is improved, but the discharge control complexity increases

Engineering Contradiction:
Improvepositioning accuracyVSAvoiddischarge control complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The control unit uses feedback from discharge amount measurements to automatically adjust discharge timing. This feedback mechanism simplifies the overall control by using measured data to drive timing adjustments, rather than requiring complex predictive models or manual calibration

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system performs self-adjustment by using its own discharge amount measurements to control its discharge timing. The control unit automatically modifies timing based on the relationship between discharge amount and material velocity, making the system self-regulating without external intervention

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables precise control of imprint material distribution, reducing defects and non-uniformity, thereby enhancing the accuracy and quality of pattern formation on substrates.

Implementation Method 1

Adjusting the discharge amount of imprint material can cause the position where imprint material is supplied to the substrate for the discharge position to deviate from the target position

Methodology Applied
Scientific EffectInertia: Inertia

Implementation Method 2

Adjusting the discharge amount of imprint material can change the speed of imprint material in accordance with the discharge amount thereof

Methodology Applied
Scientific EffectInertia: Inertia

Data Source

PatentUS11664225B2Imprint apparatus, and product manufacturing method
Publication Date: 2023.05.30 CANON KK
  • US11664225B2 patent drawing
  • US11664225B2 patent drawing
  • US11664225B2 patent drawing

AI summary

An imprint apparatus forms imprint material using a mold on a substrate. The imprint apparatus includes a movable stage configured to hold the substrate, a supply portion configured to discharge the imprint material, and a control unit configured to cause the supply portion to discharge the imprint material while moving the stage so that the imprint material is supplied onto the substrate. The control unit controls discharge of the imprint material from the supply portion so that a target amount of the imprint material is arranged at a target position on the substrate, based on property information indicating a relation between a discharge amount of imprint material from the supply portion and a position on a target object where the imprint material is to be arranged.