Imprint Method Using Dual Light Sources for Pattern Uniformity
Solution Overview
Problem
Existing imprint methods face challenges in achieving uniformity of pattern height and line width due to nonuniform exposure of the imprint material, which can lead to issues in semiconductor processing such as nonuniform etching results.
Innovation Solution
The method involves curing the imprint material using a combination of first and second light sources, where the intensity distribution of the second light is adjusted to compensate for the nonuniform exposure, ensuring that the distribution of evaluation values of the formed patterns satisfies a target distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the imprint material is exposed with a nonuniform exposure amount distribution, then the curing process can be completed, but the height of the pattern or the line width of the pattern becomes nonuniform
Solution Approach 1:
The patent applies local quality by using a light intensity distribution control unit to create a nonuniform light intensity distribution that compensates for the nonuniform exposure. Specifically, the light intensity is adjusted to be higher in regions where exposure is insufficient (such as peripheral regions or regions with larger pattern densities) and lower in regions where exposure is excessive, thereby achieving uniform pattern height and line width across the entire substrate.
Solution Approach 2:
The patent employs parameter changes by dynamically adjusting the light intensity distribution parameter of the curing light source. The light intensity distribution control unit modifies the intensity parameters of light in different spatial regions based on the specific exposure conditions, allowing the system to adapt to varying pattern densities and geometries to achieve uniform curing results.
2Manufacturing precision
If the imprint material is exposed with a nonuniform exposure amount distribution, then the curing process can be completed, but the pattern line width becomes nonuniform
Solution Approach 1:
The patent applies local quality by using a light intensity distribution control unit to create a nonuniform light intensity distribution that compensates for the nonuniform exposure. Specifically, the light intensity is adjusted to be higher in regions where exposure is insufficient (such as peripheral regions or regions with larger pattern densities) and lower in regions where exposure is excessive, thereby achieving uniform pattern height and line width across the entire substrate.
Solution Approach 2:
The patent employs parameter changes by dynamically adjusting the light intensity distribution parameter of the curing light source. The light intensity distribution control unit modifies the intensity parameters of light in different spatial regions based on the specific exposure conditions, allowing the system to adapt to varying pattern densities and geometries to achieve uniform curing results.
3Manufacturing precision
If a single light source is used for curing, then the device complexity is low, but the uniformity of pattern formation cannot be achieved
Solution Approach 1:
The patent applies universality by designing a light intensity distribution control unit that can work with existing single or multiple light source configurations. This control unit serves as a universal interface that processes exposure amount distribution information and generates appropriate light intensity distribution commands, making the system adaptable to various light source arrangements without requiring complete system redesign.
Solution Approach 2:
The patent introduces an intermediary element - the light intensity distribution control unit - that acts as a mediator between the light source(s) and the imprint material. This control unit receives information about exposure amount distribution and translates it into appropriate light intensity distribution commands, thereby decoupling the complexity of exposure control from the light source configuration itself.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly improves the uniformity of the patterns formed on the substrate, preventing extrusion of the imprint material and ensuring proper etching processes in semiconductor manufacturing.
Implementation Method 1
curing an imprint material by applying first light to the imprint material using a first light source
Implementation Method 2
applying second light to the imprint material using a second light source, wherein an intensity distribution of the second light applied to the imprint material by the second light source in the curing is adjusted
Data Source
AI summary
An imprint method of curing an imprint material in a state in which the imprint material on a substrate and a mold are in contact with each other, includes curing the imprint material by applying first light to the imprint material using a first light source and applying second light to the imprint material using a second light source, thereby forming a plurality of patterns made of a cured product of the imprint material. An intensity distribution of the second light applied to the imprint material by the second light source in the curing is adjusted such that a distribution of evaluation values of the plurality of patterns formed through the curing satisfies a target distribution.