Imprint Pattern Composition to Prevent Curable Film Crystallization
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Solution Overview
Problem
The curable imprinting method faces challenges in maintaining pattern accuracy and preventing defects over time due to heat contraction and high-pressure requirements, particularly in forming fine patterns with high dimensional precision.
Innovation Solution
A composition for forming an imprint pattern comprising a polymerizable compound, a polymerization initiator, and a derivative of the polymerization initiator, which includes acylphosphine oxide-based or alkylphenone-based initiators, is used to reduce crystallinity and prevent precipitation in the curable film, thereby suppressing defects and ensuring high accuracy even after prolonged time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If thermal imprinting method is used, then various materials can be selected, but high pressure is required and dimensional accuracy deteriorates due to heat contraction
Solution Approach 1:
The patent changes the fundamental parameter of the imprinting method from thermal to curable (photocurable or thermally curable), which eliminates heat contraction issues during the imprinting process itself. The curable composition allows pattern transfer without the dimensional instability caused by thermal expansion and contraction, thereby maintaining high dimensional accuracy while still offering material versatility through different curable resin systems
Solution Approach 2:
The patent replaces the thermal field-based imprinting mechanism with a chemical curing mechanism. Instead of relying on heat-induced softening and subsequent cooling (which causes contraction), the composition cures chemically to lock in the pattern, substituting thermal-mechanical processing with chemical crosslinking that maintains dimensional stability
2Ease of manufacture
If curable imprinting method is used, then high pressure and high temperature heating can be omitted, but defects may occur due to crystallinity and precipitation in the curable film over time
Solution Approach 1:
The patent carefully selects and controls the molecular weight, functional group composition, and chemical structure parameters of the curable composition to suppress crystallization tendency. By adjusting these parameters, the composition remains amorphous and stable over time, preventing defects while maintaining the simplicity of the curable imprinting process
Solution Approach 2:
The patent uses composite curable compositions containing multiple components (polymerizable compounds, photopolymerization initiators, and carefully selected additives) that work together to prevent crystallization. The composite nature of the material provides both ease of manufacture and long-term reliability by balancing processing properties with storage stability
3Productivity
If polymerization initiator concentration is increased, then curing speed increases, but crystallinity and precipitation increase leading to defects
Solution Approach 1:
The patent optimizes the concentration parameter of the photopolymerization initiator to a specific range (0.1-10% by mass) that balances curing speed with defect prevention. This parameter optimization ensures sufficient curing productivity while maintaining low crystallinity and preventing precipitation, thereby achieving both fast curing and high pattern accuracy
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces defects and maintains high pattern accuracy by minimizing crystallinity and precipitation in the curable film, allowing for precise and durable imprinting without the need for high pressure and heat, thus enhancing the reliability of the curable imprinting method.
Implementation Method 1
a curable film formed of the composition for forming an imprint pattern is photocured or thermally cured while the mold is pressed against the curable film
Data Source
AI summary
Provided are a composition for forming an imprint pattern, containing a polymerizable compound, a polymerization initiator, and a derivative of the polymerization initiator; a cured substance of the composition for forming an imprint pattern; a device including the cured substance; an imprint pattern producing method using the composition for forming an imprint pattern; and a method for manufacturing a device, including the imprint pattern producing method.