Imprint Apparatus Heating Unit Illumination Shape Control
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Solution Overview
Problem
Existing imprint apparatuses face challenges in achieving high overlay accuracy and cost-effectiveness due to the need for specialized optical systems to match the illumination width of light to digital micromirror devices (DMDs) with the substrate size, leading to increased costs and reduced efficiency.
Innovation Solution
An imprint apparatus with a heating unit that includes a first optical system emitting light in two directions, a changing unit to adjust the light beam's width ratio, and an intensity distribution adjusting unit, utilizing a microlens array and a cylindrical lens to achieve a uniform intensity distribution and match the illumination shape to the substrate size, thereby reducing costs and improving overlay accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of energy
If a specialized microlens array is designed to match the substrate size (33×26 mm rectangular shape), then the illumination efficiency is improved, but the manufacturing cost increases due to custom production requirements
Solution Approach 1:
The patent changes the optical parameters of a standard square microlens array by introducing a cylindrical lens with specific focal length and orientation. This transforms the illumination pattern from square to rectangular without requiring custom manufacturing of the microlens array, thus maintaining ease of manufacture while improving illumination efficiency to match the substrate aspect ratio
2Manufacturing precision
If the illumination width of light to the DMD is made similar to the shot size (33×26 mm), then the overlay accuracy is improved, but the optical system complexity increases
Solution Approach 1:
The patent introduces a cylindrical lens as an intermediary optical element between the standard microlens array and the DMD. This intermediary component transforms the square illumination pattern into a rectangular one that matches the substrate shot size, thereby improving overlay accuracy without requiring complete redesign of the optical system
Solution Approach 2:
By changing the optical parameters through the cylindrical lens (focal length, orientation, position), the illumination pattern is transformed from square to rectangular. This parameter change approach achieves the required aspect ratio matching for improved overlay accuracy while keeping the base optical system configuration simple and familiar
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables efficient and accurate overlay correction by using a standard microlens array and cylindrical lens to adjust the light beam's shape, maintaining cost-effectiveness while enhancing overlay accuracy and pattern formation precision.
Implementation Method 1
utilizing a microlens array and a cylindrical lens to achieve a uniform intensity distribution
Implementation Method 2
a changing unit configured to change a ratio of widths of the light beam emitted from the first optical system in the first direction and the second direction
Implementation Method 3
the heating unit heats the imprint region by irradiating the imprint region with the light beam from the intensity distribution adjusting unit
Data Source
AI summary
An imprint apparatus includes: a heating unit configured to heat an imprint region where an imprint process on a substrate is performed and change a shape of the imprint region. The heating unit includes a first optical system configured to emit a light beam extending in a first direction and a second direction perpendicular to an optical axis, a changing unit configured to change a ratio of widths of the light beam emitted from the first optical system in the first direction and the second direction, and an intensity distribution adjusting unit configured to adjust an intensity distribution of the light beam the ratio of which has been changed, and the heating unit heats the imprint region by irradiating the imprint region with the light beam from the intensity distribution adjusting unit.