Imprint Apparatus Illumination Condition Derivation
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Solution Overview
Problem
Existing imprint methods using light-curing techniques face challenges in efficiently determining optimal illumination conditions for all shot regions on a substrate, leading to prolonged light adjustment times and reduced throughput.
Innovation Solution
The method involves a first illumination process where optimal illumination conditions are adjusted for a plurality of first shot regions, and then deriving approximate illumination conditions for second shot regions using these adjusted conditions, thereby reducing the time required for acquiring illumination conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If light adjustment is performed for all shot regions on a first substrate to determine illumination conditions, then appropriate illumination conditions are obtained for positioning, but the time required for light adjustment becomes significantly long
Solution Approach 1:
The substrate is divided into multiple shot regions, and illumination conditions are determined for only a selected subset of these regions (first shot regions) rather than all regions. The determined conditions are then applied to the remaining regions (second shot regions), segmenting the measurement process to reduce time while maintaining adequate precision.
Solution Approach 2:
Instead of performing light adjustment for all shot regions (excessive action), the invention performs adjustment for only a partial set of shot regions (first shot regions). This partial action is sufficient to establish illumination conditions that can be applied across the entire substrate, thereby reducing adjustment time while maintaining adequate measurement precision.
2Productivity
If illumination conditions are determined for all shot regions on the entire substrate in advance, then appropriate conditions are available for all regions, but the time required to acquire these conditions increases significantly
Solution Approach 1:
The substrate processing is segmented into two categories: first shot regions where illumination conditions are actively determined through measurement, and second shot regions where conditions are derived from the first regions. This segmentation enables parallel processing and reduces the sequential time required for acquiring illumination conditions across the entire substrate.
Solution Approach 2:
Illumination conditions are determined in advance for selected first shot regions, and these conditions are then applied to second shot regions without requiring separate measurement. This preliminary determination for a subset of regions accelerates the overall process while ensuring adequate illumination conditions are available for all shot regions, thereby improving throughput.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly shortens the time needed for acquiring illumination conditions, improving throughput and producibility by allowing for more efficient alignment and curing processes across all shot regions.
Implementation Method 1
measuring the moire fringes generated due to overlapping of a substrate mark formed on the substrate with a mold mark formed on the mold
Implementation Method 2
after the imprint material molded in the mold is cured through light irradiation
Data Source
AI summary
In order to provide a method for shortening acquisition of illumination conditions, an imprint method for forming a pattern on an imprint material R supplied onto a substrate W using a mold includes: performing a first illumination process of illuminating a mold mark Mmark formed on the mold M and a substrate mark Wmark formed in each of a plurality of first shot regions on the substrate W and adjusting each of illumination conditions in a state in which the mold M and the imprint material R supplied to each of the plurality of first shot regions are brought into contact with each other; and performing a deriving process of deriving approximate illumination conditions indicating illumination conditions for a second shot region that is different from the plurality of first shot regions, on the basis of each of the illumination conditions for the plurality of first shot regions adjusted in the first illumination process.