Imprint Apparatus Light Control for Oxygen Inhibition Defects
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Solution Overview
Problem
Existing imprint technologies face pattern defects due to curing inhibition caused by oxygen in low helium concentrations, which cannot be effectively addressed by adjusting light exposure based on helium concentration or flow rate, as previous methods focus on mold release force reduction rather than curing inhibition.
Innovation Solution
An imprint apparatus with a control unit that adjusts the light exposure amount of curing light in multiple shot areas on a substrate based on defect distribution data, using a combination of shutter control, filter switching, and LED power control to optimize light exposure according to helium concentration distributions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the light amount of curing light is increased to reduce pattern defects caused by curing inhibition, then the curing completeness is improved, but the mold release force increases causing adhesion defects
Solution Approach 1:
The patent applies local quality by adjusting the light amount of curing light according to the helium concentration distribution in different shot areas. Areas with low helium concentration receive higher light amounts to ensure complete curing, while areas with sufficient helium concentration receive lower light amounts to reduce mold release force. This spatially differentiated light exposure resolves the contradiction between curing completeness and mold release by tailoring the curing conditions to local helium concentration conditions.
Solution Approach 2:
The patent changes the light amount parameter of curing light based on defect distribution data and helium concentration measurements. By dynamically adjusting the light amount parameter in different shot areas, the system optimizes both curing completeness and mold release characteristics, resolving the contradiction between these two opposing requirements.
2Reliability
If the light amount of curing light is uniformly increased across all shot areas, then pattern defects due to curing inhibition are reduced, but manufacturing precision deteriorates due to adhesion defects in areas where high light amount is unnecessary
Solution Approach 1:
The patent implements local quality by controlling the light amount of curing light individually for each shot area based on measured helium concentration distribution and defect distribution data. This prevents uniform over-irradiation and the resulting adhesion defects, thereby maintaining high manufacturing precision while ensuring curing completeness in areas that require it.
Solution Approach 2:
The patent uses defect distribution data from pattern formation results and helium concentration measurements as feedback to adjust the light amount of curing light in subsequent shots. This closed-loop control ensures that each shot area receives the appropriate light amount, preventing both curing inhibition and adhesion defects, thus maintaining high manufacturing precision.
3Reliability
If the helium concentration is increased to prevent curing inhibition, then the curing completeness is improved, but the device complexity and operational complexity increase due to the need for precise helium concentration control and distribution management
Solution Approach 1:
The patent applies self-service by using the defect distribution data from pattern formation results to automatically determine the light amount of curing light for each shot area. This eliminates the need for complex real-time helium concentration monitoring and control systems, as the system self-adjusts based on observed defect patterns, thereby reducing device complexity while maintaining curing completeness.
Solution Approach 2:
The patent uses defect distribution feedback from pattern formation to adjust helium-related parameters and light amount settings. This feedback mechanism allows the system to maintain curing completeness without requiring complex proactive helium concentration control, as the system responds to actual defect occurrences and adjusts accordingly.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus reduces pattern defects by ensuring appropriate light exposure in areas with varying helium concentrations, improving the accuracy and quality of pattern formation on substrates.
Implementation Method 1
a light source configured to irradiate with curing light for curing the imprint material
Data Source
AI summary
An imprint apparatus for forming a pattern in an imprint material on a substrate using an original as a mold, comprises an ultraviolet light generation device which irradiates with ultraviolet light which is curing light for curing the imprint material, and a control unit which controls a light amount of the ultraviolet light which is curing light. The control unit configured to perform a control of the light amount of the ultraviolet light acquires data of a defect distribution of the pattern formed on the substrate by the mold, and performs the control of the light amount of the ultraviolet light in a plurality of shot areas on the substrate based on the acquired data of the defect distribution.