Imprint Lithography Actuator System for Thermal Deformation Compensation
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Solution Overview
Problem
In imprint lithography, temperature changes in substrates and templates cause challenges in accurately aligning and overlaying imprinted patterns due to changes in shape and size, which can lead to reduced yield and device functionality.
Innovation Solution
An imprint lithography apparatus and method using a combination of actuators with different ranges of motion, where a first actuator with a smaller range, such as a piezoelectric actuator, is used for precise control of the imprint template's shape and position, and a second actuator with a larger range, like a pneumatic or hydraulic actuator, is used to compensate for temperature-induced changes in the substrate and template, ensuring accurate alignment and overlay.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If temperature changes occur in substrates and templates during imprint lithography, then the shape and size of imprinted patterns change, but alignment and overlay accuracy deteriorates
Solution Approach 1:
The patent applies parameter changes by using actuators to dynamically adjust the position and shape of the imprint template in response to temperature changes. The system monitors temperature variations and compensates for thermal expansion or contraction by modifying the template's physical parameters (position, shape) to maintain alignment accuracy despite temperature fluctuations.
2Adaptability or versatility
If a single actuator with large range of motion is used to compensate for temperature changes, then alignment compensation capability improves, but positioning precision deteriorates
Solution Approach 1:
The patent segments the actuation system into multiple actuators with different ranges of motion. A first actuator with smaller range provides fine positioning precision, while a second actuator with larger range provides temperature compensation capability. This segmentation allows the system to achieve both high precision and broad adaptability by coordinating the actions of multiple specialized actuators.
Solution Approach 2:
The system dynamically selects and coordinates between actuators of different types based on the magnitude and nature of required adjustments. For small positioning corrections, the high-precision actuator is used; for larger temperature-induced dimensional changes, the high-range actuator is engaged. This dynamic allocation optimizes both precision and compensation capability.
3Manufacturing precision
If multiple actuators with different ranges of motion are used, then both positioning precision and temperature compensation improve, but device complexity increases
Solution Approach 1:
The patent implements multi-functionality by designing a coordinated actuator system where multiple actuators work together to achieve both fine positioning and gross temperature compensation. The control system integrates the functions of different actuators, allowing a single unified system to perform multiple functions (precision positioning and thermal compensation) that would otherwise require separate systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for precise control of the imprint template's shape and position, effectively addressing temperature-induced changes, thereby improving the accuracy of pattern alignment and overlay, and enhancing the yield of functioning devices.
Implementation Method 1
a first actuator with a smaller range, such as a piezoelectric actuator, is used for precise control of the imprint template's shape and position
Implementation Method 2
compensate for temperature-induced changes in the substrate and template
Implementation Method 3
a second actuator with a larger range, like a pneumatic or hydraulic actuator, is used to compensate for temperature-induced changes
Data Source
AI summary
An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.