Imprint Lithography Alignment Mark Space Reduction
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Solution Overview
Problem
Current alignment mark arrangements in imprint lithography require excessive space on templates and substrates, reducing throughput and increasing costs, and are prone to degradation during processing, which affects the accuracy of pattern application.
Innovation Solution
An alignment arrangement comprising a first fine alignment mark in the form of a substantially regular grating and a second coarse alignment mark located in the same area, which can be a gap or line of different width, allows for efficient space utilization and minimizes degradation by using a dual-mark system that reduces the overall space required for alignment marks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If separate coarse and fine alignment marks are provided in different locations, then alignment functionality is achieved, but the space occupied by alignment marks increases
Solution Approach 1:
The patent combines coarse alignment mark and fine alignment mark into a single integrated alignment structure. The coarse alignment mark includes both a first alignment feature for coarse alignment and a second alignment feature for fine alignment, eliminating the need for separate alignment mark locations and reducing the total space occupied on the substrate.
Solution Approach 2:
The alignment structure uses a nested arrangement where the fine alignment feature is positioned within or adjacent to the coarse alignment feature. This nesting allows both coarse and fine alignment functions to coexist in a compact space, with the fine alignment mark being contained within the broader context of the coarse alignment mark area.
2Measurement precision
If alignment marks are made opaque for better detection, then alignment detection is improved, but the alignment marks are more prone to degradation during processing
Solution Approach 1:
The patent applies different material properties to different parts of the alignment structure. The coarse alignment mark uses an opaque material for high detectability, while the fine alignment feature uses a different material or structure that is less prone to degradation. This local differentiation allows each feature to be optimized for its specific function while maintaining overall reliability.
Solution Approach 2:
The alignment structure employs composite materials where the coarse alignment mark is formed from an opaque material optimized for detection, and the fine alignment feature is formed from a different material that provides both detectability and resistance to processing degradation. This composite approach allows simultaneous optimization of detection quality and material stability.
3Measurement precision
If more space is allocated to alignment marks, then alignment accuracy is maintained, but the number of patterns that can be created on substrates decreases
Solution Approach 1:
By merging coarse and fine alignment marks into a single integrated structure, the patent reduces the total space required for alignment functionality. This space reduction directly increases the available substrate area for creating patterns, thereby improving productivity and pattern creation throughput while maintaining both coarse and fine alignment capabilities.
Solution Approach 2:
The patent optimizes the spatial arrangement of alignment features by utilizing two-dimensional positioning efficiently. The coarse and fine alignment features are arranged in a compact configuration that minimizes the bounding box area, allowing more substrate area to be dedicated to pattern creation while preserving alignment precision in both lateral dimensions.
Data Source
AI summary
An object provided with a particular alignment arrangement for use in aligning the object and a further object with respect to each other is disclosed. The alignment arrangement includes a first fine alignment mark in the form of a substantially regular grating, and a second coarse alignment mark located in the same area as the first alignment mark.