Imprint Lithography Droplet Pattern Control for Uniform Filling

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Solution Overview

Problem

Traditional fluid dispense systems in imprint lithography face limitations in adjusting inter-droplet spacing, leading to non-uniform template feature fill rates and increased time to form properly filled patterns, resulting in defects such as extrusion and non-fill defects.

Innovation Solution

A method for generating a fluid droplet pattern with varying linear densities in rows, where the density along the edge of the imprint field is adjusted to optimize drop edge exclusion, allowing for quicker filling of the imprint field without defects, by determining the mean optimum drop edge exclusion and moving the droplet pattern relative to the imprint field.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional fluid dispense systems are used with fixed inter-droplet spacing, then the system structure remains simple, but the template feature fill rate becomes non-uniform and defect rates increase

Engineering Contradiction:
Improvetemplate feature fill uniformityVSAvoiddroplet pattern generation complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent implements dynamic adjustment of inter-droplet spacing by varying the droplet pitch in different regions of the imprint field. The system transitions from fixed spacing to variable spacing, where the droplet pattern is dynamically adapted based on position within the field, enabling uniform template feature fill rates across different areas while managing complexity through systematic control algorithms.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent applies local quality by implementing region-specific droplet spacing parameters. Different linear densities are used in different rows and columns of the imprint field, with edge regions receiving different treatment than center regions. This localized optimization ensures that each area of the template receives appropriate droplet density for uniform filling, addressing the non-uniformity problem through spatially varying parameters.

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If inter-droplet spacing is adjusted to achieve uniform fill rates, then manufacturing precision improves, but the time required to form properly filled patterns increases

Engineering Contradiction:
Improvetemplate feature fill uniformityVSAvoidpattern formation time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent implements preliminary action by pre-calculating and storing optimal droplet patterns for different regions of the imprint field before actual dispensing. The system prepares variable pitch configurations in advance, allowing the dispensing process to execute efficiently without real-time calculation delays. This pre-computation approach enables uniform filling while minimizing the time penalty associated with complex pattern generation.

Inventive Principle:
Principle #10Preliminary action

3Manufacturing precision

If variable droplet pitch is implemented across different rows, then template feature fill uniformity improves, but the control system complexity increases

Engineering Contradiction:
Improvelinear density uniformityVSAvoiddroplet pattern control complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies segmentation by dividing the imprint field into distinct rows and columns, each with independently optimized droplet pitch parameters. The system segments the control space into manageable regions (first row, second row, third row with different linear densities) that can be controlled and adjusted independently. This segmentation approach enables precise linear density control in each region while simplifying the overall control architecture through modular parameter management.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS11635684B1Apparatus for imprint lithography configured to generate a fluid droplet pattern and a method of using such apparatus
Publication Date: 2023.04.25 CANON KK
  • US11635684B1 patent drawing
  • US11635684B1 patent drawing
  • US11635684B1 patent drawing

AI summary

An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid droplet pattern includes an imprint field, wherein the imprint field has an edge and a drop edge exclusion along the edge. In another aspect, a method can be carried out using the apparatus. The apparatus and method can be useful in filling an imprint field with a formable material relatively quickly without extrusion defects or other complications. The method can include determining a fluid droplet pattern with a first row along the edge of the imprint field having a first linear density and a second row having a second linear density, where the first linear density, the amount of droplets in the first row, is different than a second linear density, amount of droplets within the second row.