Imprint Lithography Encoder Arrays for Template Alignment
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In imprint lithography, determining the precise position, rotation, and expansion of multiple imprint templates is challenging due to obstruction of interferometer beams, leading to difficulties in achieving accurate pattern alignment and meeting overlay requirements, and existing solutions are costly.
Innovation Solution
An imprint lithography apparatus with a configuration determination arrangement comprising arrays of lines and encoders that allow for relative positioning and measurement of imprint templates and substrates, enabling accurate determination of position, rotation, and expansion without the need for multiple interferometers, using a structure with arrays of lines and encoders to determine relative configurations in multiple degrees of freedom.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If interferometric arrangements are used to determine relative positioning between imprint templates and substrates, then measurement precision is improved, but device complexity and cost increase
Solution Approach 1:
The patent uses encoder gratings as optical copies or representations of position information. Instead of using complex interferometers to measure position, the system encodes position information directly into the grating patterns on the templates and substrates. The encoder reads these patterns to determine relative positioning, effectively copying position information into a readable format that simplifies the measurement system.
2Measurement precision
If multiple interferometers are used to monitor multiple imprint templates, then measurement precision is improved, but device complexity and cost increase
Solution Approach 1:
The encoder system serves multiple functions: it tracks position, orientation, and relative configuration between templates and substrates. A single encoder can monitor multiple templates by reading their respective grating patterns, eliminating the need for separate interferometers for each template. The system is designed to handle multiple templates simultaneously using the same encoder infrastructure.
3Measurement precision
If interferometer beams are used to determine template position, then measurement precision is improved, but the beams are obstructed by templates and holders
Solution Approach 1:
The patent replaces the optical interferometer system with a mechanical/electronic encoder system. Instead of using light beams that can be obstructed by physical objects, the system uses physical grating patterns that can be directly read by encoders. The grating patterns are attached to or integrated with the templates and holders, ensuring they are always accessible to the encoder regardless of the presence of other components.
4Device complexity
If expansion of imprint templates is not monitored, then device complexity is reduced, but manufacturing precision deteriorates
Solution Approach 1:
The encoder system provides continuous feedback on the relative configuration between templates and substrates, including any expansion or contraction. This feedback information is used to adjust the positioning and alignment in real-time, compensating for thermal expansion or other dimensional changes. The system monitors and responds to template expansion to maintain manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for accurate and consistent pattern application on substrates by determining the relative configuration between imprint templates and substrates, overcoming the limitations of interferometer obstruction and reducing costs associated with interferometric arrangements.
Implementation Method 1
one or more interferometers may be used to determine the distance from a fixed frame to the substrate holder, and another interferometer may be used to determine the distance from the same fixed frame to the imprint template holder
Data Source
AI summary
An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.