Imprint Lithography Template Moat System for Alignment Mark Protection
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Solution Overview
Problem
In imprint lithography, there is a challenge in properly aligning templates with substrates without the polymerizable liquid interfering with alignment marks, as existing methods struggle to prevent the liquid from superimposing with these marks, which is crucial for accurate pattern transfer and feature formation.
Innovation Solution
A moat system is introduced around the alignment marks on the template, featuring recessed areas with arcuate boundaries to prevent the liquid from reaching the marks, thereby minimizing the risk of liquid interference and ensuring accurate alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the polymerizable liquid is deposited on the substrate and contacted by the template to spread over the surface, then the liquid fills the space between template and substrate for pattern transfer, but the liquid may superimpose with alignment marks causing misalignment and reducing manufacturing precision
Solution Approach 1:
The template surface is segmented into patterned areas and alignment mark areas by introducing moats (recessed regions) that physically divide the liquid flow paths. This segmentation prevents the polymerizable liquid from reaching the alignment marks while still allowing sufficient liquid in the patterned areas for effective pattern transfer.
Solution Approach 2:
Different regions of the template are given different properties: the patterned areas have sufficient depth and surface area to hold and spread the polymerizable liquid for pattern transfer, while the alignment mark areas are protected by moats that prevent liquid accumulation. This local differentiation ensures proper liquid distribution without interference with alignment marks.
2Manufacturing precision
If the template and substrate are brought into close contact for pattern transfer, then the pattern fidelity is improved, but the liquid may more easily reach and interfere with alignment marks
Solution Approach 1:
Moats are pre-formed on the template surface in proximity to alignment marks before the imprinting process. These moats create preliminary barriers that actively prevent the polymerizable liquid from reaching the alignment marks, countering the harmful effect of liquid interference before it can occur during template-substrate contact.
Solution Approach 2:
The solution introduces a vertical dimension (depth) to the template surface structure by creating recessed moats. This dimensional change allows the template to control liquid flow not just in the horizontal plane but also vertically, preventing liquid from bridging the gap to alignment marks even when the template and substrate are in close contact.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The moat system effectively reduces the likelihood of liquid interference with alignment marks, enhancing the precision of the imprint lithography process by maintaining the liquid within designated areas, thus facilitating accurate pattern transfer and improved feature formation on the substrate.
Implementation Method 1
The recess is dimensioned to reduce, if not prevent, a liquid moving along a surface of the body from traveling between the first and second areas
Data Source
AI summary
The present invention is directed to a body having a first area and a second area separated by a recess. The recess is dimensioned to reduce, if not prevent, a liquid moving along a surface of the body from traveling between the first and second areas. One or more alignment marks may be positioned within one of the first and second areas. In this manner, the recess functions as a moat by reducing, if not preventing, a quantity of the liquid from being in superimposition with the alignment marks.


