Imprint Lithography Orientation Stage Alignment Control
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Solution Overview
Problem
In micro-fabrication processes, particularly in imprint lithography, achieving precise alignment between a template and a substrate is challenging due to mechanical compliance issues and misalignment problems, which affect the accuracy and resolution of pattern formation.
Innovation Solution
An orientation stage with a compliant device and actuators is used to provide precise angular and translational motion, allowing for the alignment of a template with a substrate by controlling the gap between them, utilizing flexure joints and actuators to minimize mechanical compliance and friction, thereby ensuring accurate spatial arrangement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional orientation stages with guide shafts and sliders are used, then the device structure is simple, but mechanical compliance and friction cause misalignment and reduce manufacturing precision
Solution Approach 1:
The patent replaces conventional mechanical guide shafts and sliders with a magnetic field-based actuation system. Magnets embedded in the template interact with a magnetometer sensor to detect position and orientation, while magnetic actuators provide contactless positioning forces, eliminating mechanical friction and compliance issues that limit alignment accuracy.
Solution Approach 2:
The system changes the physical parameters of the orientation stage by using magnetic field interactions instead of mechanical contact. The magnetometer detects magnetic field parameters to determine template position and orientation, while magnetic actuators adjust these parameters dynamically, achieving sub-millimeter alignment accuracy without mechanical wear.
2Manufacturing precision
If the gap between template and substrate is not precisely controlled, then the device operation is simple, but pattern formation resolution and manufacturing precision deteriorate
Solution Approach 1:
The patent implements a feedback control system where a magnetometer continuously detects the magnetic field signature of the template to determine its precise position and orientation relative to the substrate. This feedback information is used to adjust the gap distance dynamically, ensuring optimal spacing for high-resolution pattern formation while automatically compensating for positioning variations.
Data Source
AI summary
Systems to control movement of a template during an imprint lithography process are described. The systems include an orientation stage having an inner frame, and outer frame, and a plurality of actuators coupled between the inner frame and the outer frame to vary translational motion and impart angular motion about a plurality of axes.