Imprint Lithography Template Arrays for Overlay Accuracy
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Solution Overview
Problem
Current imprint lithography processes face challenges in achieving overlay accuracy and high throughput, particularly due to limitations in resolution and line edge roughness, as well as the need for complex and expensive optics in conventional photolithography systems.
Innovation Solution
The use of an imprint lithography apparatus with multiple arrays of template holders and a substrate table that supports a substrate, allowing for the interspersing or alternating patterns imprinted by different template arrays to cover the entire usable surface efficiently, along with the integration of a lens system for uniform radiation distribution and alignment systems for precise pattern alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photolithography uses shorter wavelength radiation to achieve higher resolution, then feature size reduction is possible, but the system becomes extremely expensive requiring complex optics, ultra high vacuum systems and rare materials
Solution Approach 1:
The patent replaces the complex optical system with a mechanical imprinting system. Instead of using radiation and optics to define patterns, a physical template with the desired pattern is mechanically pressed into an imprintable medium, transferring the pattern directly without requiring complex optical paths, vacuum systems, or specialized radiation sources.
Solution Approach 2:
The patent uses a physical template that contains a copy of the desired pattern. This template is mechanically pressed into the imprintable medium to transfer the pattern, eliminating the need for complex optical systems and radiation sources while achieving high resolution through direct physical copying of the template geometry.
2Area of stationary object
If imprint lithography uses a single array of templates, then the process is simple, but the usable surface area of the substrate cannot be fully utilized
Solution Approach 1:
The patent divides the template system into multiple arrays (first array and second array) that can be used in sequence or parallel. The first array imprints patterns in certain regions while the second array imprints patterns in interspersed or alternating regions, allowing complete coverage of the substrate surface through systematic segmentation of the imprinting process.
Solution Approach 2:
The patent utilizes the temporal dimension by implementing a multi-step imprinting process where the first array is used, then the second array is used to imprint interspersed or alternating patterns. This sequential approach in time allows both arrays to contribute to the final pattern on different regions of the substrate, maximizing surface utilization.
3Area of stationary object
If imprint templates cover adjacent imprint areas, then coverage is improved, but alignment precision deteriorates due to footprint overlap
Solution Approach 1:
The patent applies different footprint configurations to different template holders based on their specific requirements. Some template holders may have footprints that extend into adjacent areas while others maintain stricter boundaries, allowing optimization of both coverage and alignment precision for different regions of the substrate based on local needs.
Data Source
AI summary
An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.