Imprint Lithography Template Filling via Selective Liquid Removal
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Solution Overview
Problem
In nano-fabrication processes, particularly in imprint lithography, there is a need to minimize the time required to fill the features of a template with polymerizable liquid while ensuring accurate deposition and removal of the material, as existing techniques are inefficient in achieving rapid and precise filling.
Innovation Solution
A method involving the deposition of a liquid onto a substrate with recesses, where a portion of the liquid ingresses into the recesses and is then removed using a vacuum or fluid stream, allowing for precise filling and transfer of the liquid to another substrate, with the option to cross-link with a flowable material using actinic radiation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If liquid is deposited on the substrate to fill recesses, then the filling speed is improved, but the precision of material removal from non-recess areas deteriorates
Solution Approach 1:
The substrate surface is segmented into recess areas and non-recess areas, with the liquid deposition process targeting specifically the recess regions. The vacuum or fluid stream removal process then selectively removes liquid from non-recess areas while preserving liquid in recesses, achieving both rapid filling and precise material placement.
Solution Approach 2:
Different regions of the substrate surface are treated with different properties: recess areas receive and retain liquid material while non-recess areas have liquid removed. This local differentiation allows the system to achieve rapid overall filling while maintaining high precision in the final material distribution pattern.
2Manufacturing precision
If vacuum or fluid stream is used to remove liquid from non-recess areas, then the precision of pattern formation is improved, but the processing time increases
Solution Approach 1:
The liquid is first deposited on the substrate to fill the recesses before the vacuum or fluid stream removal process is applied. This preliminary deposition ensures that the recesses are already filled, so the subsequent removal process only needs to clean up non-recess areas, significantly reducing the total processing time while maintaining high precision.
Solution Approach 2:
The method rushes through the filling phase by depositing liquid broadly across the substrate surface first, then quickly transitions to the precision removal phase using vacuum or fluid stream. This two-stage approach skips the time-consuming step of attempting to deposit liquid only in recesses from the beginning, achieving both speed and precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enhances the efficiency of filling template features, allowing for faster processing times and improved precision in nano-fabrication, enabling the creation of patterned layers with controlled residual thickness, which is crucial for advanced semiconductor and biotechnology applications.
Implementation Method 1
removing material present on the substrate, outside of the recesses using fluid, i.e., apply a vacuum or a jet of fluid
Implementation Method 2
cross-linking therewith by exposing the liquid and the flowable material to actinic radiation
Data Source
AI summary
A method of depositing material upon a substrate features filling recesses of a substrate with liquid and removing material present on the substrate, outside of the recesses using fluid, i.e., apply a vacuum of a jet of fluid. To that end, one method of the present invention includes depositing a measure of liquid upon a surface of a substrate having a recess formed therein to ingress into a volume of the recess with a portion of the liquid. A quantity of the liquid is disposed upon regions of the surface proximate to the recess. Thereafter, the quantity of liquid is removed while maintaining the portion within the volume. In this manner, the portion may be transferred onto an additional substrate. More specifically, the portion may be placed in contact with a layer of flowable material and cross-linking therewith by exposing the liquid and the flowable material to actinic radiation.