Imprint Mold Charge Removal via Ionized Gas and Conductive Peripheral Member
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Solution Overview
Problem
Existing imprint technologies face challenges in effectively removing charges from molds due to decreased ion concentration of ionized gas, especially in narrow spaces, leading to potential defects and mold damage from foreign substances.
Innovation Solution
An imprint apparatus with a gas supplying unit and a control unit that sandwiches a holding unit for the mold, initiating gas supply before moving the stage and using a conductive peripheral member to facilitate charge removal through a gas with a long mean free path, such as helium, to promote electron avalanches and efficiently neutralize charges on the mold.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If ionized gas is supplied to remove charges from the mold, then charge removal effectiveness is improved, but ion concentration decreases in narrow spaces with long gas passage routes
Solution Approach 1:
The gas supplying unit initiates gas supply before the stage moves the substrate below the dispenser, pre-filling the space between mold and substrate with ionized gas. This preliminary action ensures high ion concentration is already present when charge removal is needed, overcoming the concentration loss from long passage routes
Solution Approach 2:
A peripheral member with a conductive surface is introduced as an intermediary between the gas supplying unit and the mold. This conductive member facilitates charge removal by providing a path for charge dissipation while the ionized gas flows through the space, enhancing the charge removal effectiveness without requiring direct contact between the gas source and mold
2Manufacturing precision
If the space between mold and substrate is made narrow for better pattern fidelity, then manufacturing precision is improved, but gas passage efficiency deteriorates leading to ion concentration loss
Solution Approach 1:
The system pre-supplies ionized gas to the narrow space between mold and substrate before the imprint process begins. This preliminary gas supply ensures that even though the narrow space creates long effective passage routes, the ion concentration remains high when charge removal is performed, maintaining both pattern fidelity and charge removal effectiveness
Solution Approach 2:
The patent replaces direct mechanical contact-based charge removal with a field-based approach using ionized gas and a conductive peripheral member. This substitution allows charge removal to occur through the narrow space without requiring physical access, maintaining the narrow gap needed for pattern fidelity while enabling effective charge removal
3Object-affected harmful factors
If charges remain on the mold after imprint material separation, then foreign substances are attracted to the mold, but charge removal using conventional methods is insufficient in narrow spaces
Solution Approach 1:
The peripheral member with a conductive surface acts as an intermediary that enhances charge removal from the mold. When ionized gas flows through the space between the mold and substrate, the conductive peripheral member provides an additional path for charge dissipation, working synergistically with the ionized gas to effectively remove charges and prevent foreign substance attraction
Solution Approach 2:
The system uses ionized gas (typically noble gases like helium or argon) to create an inert environment between the mold and substrate. This inert ionized atmosphere serves dual purposes: it provides ions for charge removal and creates a clean environment that prevents foreign substance generation and attraction during the imprint process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively removes charges from the mold, reducing the likelihood of foreign substance adherence and defects, while maintaining cleanliness and preventing mold damage.
Implementation Method 1
supplying an ionized gas to a space between the mold and the substrate
Implementation Method 2
promote electron avalanches and efficiently neutralize charges on the mold
Implementation Method 3
a peripheral member arranged in the periphery of a portion where the substrate is to be held on the stage and includes a conductive surface on the side of the mold
Data Source
AI summary
There is provided that an imprint apparatus that forms a pattern on a substrate by curing an imprint material in a state in which a mold and the imprint material on the substrate are in contact with each other, the apparatus including a control unit configured to control a movement of a stage configured to hold the substrate and the supplying of a gas by a gas supplying unit, wherein the control unit removes charges from the mold by starting the supplying of the gas by the gas supplying unit before starting to move the stage below a dispenser after the mold and the cured imprint material are separated, and making a peripheral member face the mold via the gas during the movement of the stage.