Imprint Mold Deformation Control for Bubble-Free Pattern Transfer
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Solution Overview
Problem
Existing imprint apparatuses face challenges in maintaining alignment and throughput due to changes in relative positions of the mold and substrate during the imprint process, which can lead to defects from bubbles in the concave portions of the mold pattern.
Innovation Solution
An imprint apparatus with a deformation unit that deforms the mold or substrate into a convex shape, allowing controlled contact area increase while maintaining relative positional relationships through a control unit that adjusts the deformation amount and positions to prevent bubble formation and alignment issues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the mold deformation is decreased gradually to increase the contact area, then the bubble formation is reduced, but the relative positions of the mold and substrate change making alignment difficult
Solution Approach 1:
The control unit continuously monitors the relative positions of the mold and substrate during the deformation process and provides feedback to adjust the deformation amount, ensuring alignment is maintained while increasing contact area
Solution Approach 2:
The system dynamically changes the deformation parameter of the mold during the imprint process, starting with high deformation to expel bubbles and gradually reducing it while maintaining alignment through position control
2Productivity
If the contact area is increased quickly to improve throughput, then productivity increases, but bubbles remain in the concave portion causing defects
Solution Approach 1:
The mold is pre-deformed into a convex shape before contact to expel bubbles from the concave portions, preventing defect formation before the imprint process begins
Solution Approach 2:
The mold deformation amount is dynamically adjusted during the contact process, transitioning from a convex shape that expels bubbles to a flatter shape that increases contact area, optimizing both quality and speed
3Reliability
If the mold is deformed into a convex shape to reduce bubbles, then pattern quality improves, but the contact area is initially small reducing throughput
Solution Approach 1:
The mold deformation follows a periodic pattern: initially deformed to convex shape for bubble expulsion, then gradually flattened to increase contact area, creating a time-dependent deformation sequence that balances quality and throughput
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces bubble-related defects and enhances throughput by maintaining precise alignment and contact area management during the imprint process.
Implementation Method 1
a deformation unit configured to deform at least one of the mold and the substrate into a convex shape protruding toward the other
Data Source
AI summary
The present invention provides an imprint apparatus which forms a pattern in an imprint material on a substrate using a mold, the apparatus comprising a deformation unit configured to deform at least one of the mold and the substrate, and a control unit configured to control a process of starting contact between the mold and the imprint material in a state in which the at least one is deformed, and then gradually increasing a contact area between the mold and the imprint material by gradually decreasing a deformation amount of the at least one, wherein the control unit controls relative positions of the mold and the substrate based on the deformation amount, so as to maintain a relative positional relationship between the mold and the substrate at a region where the mold and the imprint material are contact with each other.