Imprint Mold Deformation and Tilt Control for Contact Position Precision
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Solution Overview
Problem
In the manufacturing of semiconductor devices and MEMS, existing imprint apparatuses face challenges in achieving effective filling of the mold with imprint material, particularly in partial shot regions where the pattern size is smaller than the mold, due to inadequate control over the contact position and pressure distribution between the mold and substrate.
Innovation Solution
The method involves using a deformation unit to convexly shape both the mold and substrate, and an adjustment unit to tilt the mold relative to the substrate, with a control system determining optimal pressure values and tilt adjustments to ensure the mold contacts the imprint material at a target position, enhancing the filling process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the mold contacts the imprint material from the end portion to promote filling, then the filling progress improves, but the contact position cannot be precisely controlled at a desired position in partial shot regions
Solution Approach 1:
The patent applies parameter changes by adjusting the deformation amounts of the mold and substrate, as well as the tilt angle of the mold, to precisely control the contact position. By varying these parameters, the system can determine optimal conditions where the mold contacts the imprint material at a desired position, solving the contradiction between filling progress and contact position control precision
Solution Approach 2:
The patent employs preliminary action by determining the contact position and optimizing deformation/tilt parameters before the actual imprint process begins. This pre-determination allows the system to set the mold and substrate in the correct initial state, ensuring both advantageous filling progress and precise contact position control from the start of the imprint process
2Manufacturing precision
If pressure is applied to deform mold and substrate into convex shape, then the contact position control improves, but the system complexity increases due to multiple pressure control requirements
Solution Approach 1:
The patent applies universality by using a single deformation control mechanism that simultaneously achieves multiple functions: deforming the mold into a convex shape, deforming the substrate into a convex shape, and controlling the contact position through coordinated deformation. This multi-functional approach reduces system complexity while maintaining high contact position precision
Solution Approach 2:
The patent merges the deformation control of the mold and substrate into a coordinated system where both components are deformed together in a controlled manner. By combining these deformation actions and controlling them through a unified parameter set (deformation amounts and tilt angle), the system achieves precise contact position control without requiring separate complex control systems for each component
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for more advantageous filling of the mold with imprint material, improving productivity and preventing damage by precisely controlling the contact position and pressure distribution, especially in partial shot regions.
Implementation Method 1
controlling a deformation unit configured to deform each of the mold and the substrate into a convex shape toward a space between the mold and the substrate by applying a pressure to each of the mold and the substrate
Implementation Method 2
an adjustment unit configured to adjust a relative tilt between the mold and the substrate
Data Source
AI summary
An imprint method of performing an imprint process of forming a pattern of an imprint material on a substrate by using a mold, the method including determining, before performing the imprint process, by using a function including, as variables, a pressure value applied to the mold, a pressure value applied to the substrate, and a relative tilt amount between the mold and the substrate, and expressing a contact position between the mold and the imprint material on the substrate, pressure values to be applied to the mold and the substrate, respectively, by a deformation unit and a relative tilt amount between the mold and the substrate to be adjusted by an adjustment unit such that a contact position to start a contact between the mold and the imprint material on the substrate matches a target position.