Layered Imprint Mold Etching Stopper Recess Depth Control
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Solution Overview
Problem
Existing imprint molds struggle to achieve high accuracy in forming three-dimensional transfer patterns with recesses of less than 1 μm in width or depth, which is crucial for producing optical elements with high precision.
Innovation Solution
A method for manufacturing an imprint mold involving a stack of mold base material layers and an etching stopper layer, where the mold base material layers and etching stopper layers have etching selectivity for each other, allowing for precise formation of recesses with different depths through controlled etching processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional imprint mold method is used to form fine patterns, then the manufacturing process is simple, but the formation accuracy of three-dimensional transfer patterns with recesses less than 1 μm is insufficient
Solution Approach 1:
The mold structure is segmented into multiple mold base material layers with different thicknesses, where each layer contributes to forming recesses at specific depth ranges. This segmentation enables precise control of three-dimensional transfer patterns by selectively etching through specific layer combinations, resolving the contradiction between high formation accuracy and structural simplicity.
Solution Approach 2:
The invention transitions from controlling only recess depth to controlling both recess depth and lateral dimensions through the layered structure. By varying the thickness of mold base material layers and utilizing etching selectivity, the method achieves precise three-dimensional pattern formation, addressing the accuracy requirement while maintaining manageable complexity.
2Manufacturing precision
If the mold pattern is transferred at the same magnification as the final product, then the pattern accuracy is directly reflected in the optical element accuracy, but it becomes extremely difficult to form the transfer pattern with the required high accuracy
Solution Approach 1:
By dividing the mold into multiple base material layers with different thicknesses, the invention simplifies the formation of accurate three-dimensional patterns. Each layer can be etched independently to create recesses at predetermined depths, making it easier to achieve high transfer pattern accuracy without requiring extremely difficult single-step etching processes.
Solution Approach 2:
The mold structure is prepared in advance with multiple layers of specific thicknesses designed to correspond to the desired recess depth ranges. This preliminary structuring enables direct transfer of accurate patterns during the etching process, eliminating the need for complex post-processing or iterative adjustments to achieve the required precision.
3Manufacturing precision
If multiple recesses with different depths are formed in the mold, then the three-dimensional pattern accuracy is improved, but the manufacturing process becomes more complex
Solution Approach 1:
The manufacturing process is segmented into systematic etching steps corresponding to different mold base material layers. Each etching step targets a specific depth range by removing predetermined combinations of layers, transforming a complex multi-depth formation process into a series of manageable, repeatable operations with clear depth control.
Solution Approach 2:
The invention changes the physical parameter of layer thickness to encode depth information. By designing mold base material layers with specific thicknesses that correspond to target recess depths, the manufacturing process achieves high depth accuracy through controlled material removal rather than complex positioning and measurement, simplifying the overall process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves high formation accuracy of three-dimensional shape transfer patterns with multiple recesses, significantly improving the precision of optical elements by ensuring accurate depth and position control of the recesses.
Implementation Method 1
the mold base material layer and the etching stopper layer are made of materials having etching selectivity for each other
Data Source
AI summary
Provided are an imprint mold having a plurality of recesses constituting a predetermined mold pattern, in which the imprint mold comprises a stack, comprising a plurality of mold base material layers and an etching stopper layer interposed between the mold base material layers, on a substrate, the stack has the plurality of recesses having different depths, the mold base material layer and the etching stopper layer are made of materials having etching selectivity for each other, and each of the plurality of recesses has a bottom surface on which the etching stopper layer is exposed, and technology related thereto.