Imprint Mold Measurement Mark Structure for Deviation Detection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing imprint methods face challenges in accurately detecting the deformation and deviation of measurement marks in replica molds and pattern structures due to errors during the imprint process, leading to difficulties in maintaining high accuracy and precision.
Innovation Solution
An imprint mold with a specific design featuring a base with an uneven structure area, measurement area, and measurement mark structure having pattern sets with rotational symmetry and line/space shapes, where the dimensions and intervals are optimized to be below the resolution of position detection apparatuses, and a dummy pattern area with dot-shaped or line/space-shaped depressions/projections to prevent deformation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If measurement marks are formed in the replica mold and pattern structure to detect deviation, then the magnitude and direction of deviation can be detected, but the measurement marks themselves are deformed to be thicker, thinner, or bent due to error factors during imprinting, making accurate detection difficult
Solution Approach 1:
The patent uses a master mold with measurement marks to create replica molds, and then uses those replica molds to form pattern structures. By copying the measurement marks through the imprint process, the system can detect deviations while the dummy patterns compensate for deformation effects during release
Solution Approach 2:
The patent introduces dummy patterns (dummy uneven structures) around the measurement marks that have the same shape and size as the measurement marks. These dummy patterns experience the same deformation during release but are not used for measurement, allowing the system to compensate for deformation effects and maintain measurement accuracy
2Manufacturing precision
If electron beam lithography is used to manufacture the master mold, then high precision patterns can be formed, but the manufacturing cost increases and the drawing time becomes long
Solution Approach 1:
The patent performs electron beam lithography once to create a master mold with measurement marks and dummy patterns. This master mold is then used repeatedly to create multiple replica molds through the imprint method, eliminating the need for repeated electron beam drawing and significantly improving productivity while maintaining high precision
Solution Approach 2:
The master mold created by electron beam lithography serves as a template to produce multiple replica molds through copying. This allows the high-precision master to be replicated many times, transferring the precision to multiple tools without repeating the expensive and time-consuming electron beam process
3Reliability
If a foreign object enters between the mold and transfer substrate during imprint, then both the mold and transfer substrate are significantly damaged, but using electron beam lithography to manufacture the mold makes the mold expensive and difficult to replace
Solution Approach 1:
The patent creates a master mold that can be used to produce multiple replica molds. If a replica mold is damaged by foreign object contamination, it can be replaced with another replica or a new one created from the durable master mold, reducing the impact of damage and improving ease of replacement
Solution Approach 2:
The master mold is designed with measurement marks and dummy patterns that allow for deviation detection and correction. This preliminary setup enables monitoring of the imprint process quality, allowing early detection of issues that could lead to foreign object damage, and provides a template for creating replacement molds
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables accurate detection of pattern deviations and deformations, facilitating precise correction and maintaining high accuracy in pattern formation, thereby stabilizing the fabrication of high-accuracy pattern structures.
Implementation Method 1
light is emitted from the side of the mold in this state and the photo-curable resin is thereby cured
Data Source
AI summary
An imprint mold has a base, an uneven structure area set on a surface of the base, a measurement area set in the uneven structure area, and a measurement mark structure positioned in the measurement area, the measurement mark structure having a plurality of pattern sets each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.