Imprint Mold Splicing Interface Height Control
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Solution Overview
Problem
Current methods for manufacturing large-area molds with nano-structure patterns are costly and prone to issues like overlapping and height differences, affecting the quality of nanoimprint and etching processes.
Innovation Solution
The method involves creating an imprint mold with multiple mold patterns of varying dimensions where the top faces are on the same level, using a process that includes disposing hard mask layers and forming patterns through photolithography, ensuring no height differences between patterns, and using a splicing method to form larger patterns from smaller mother molds.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If multiple small molds are spliced to form a large-area mold, then the manufacturing area is improved, but overlapping and height differences occur at splicing interfaces
Solution Approach 1:
The patent divides the large-area mold into multiple small mother molds that can be independently manufactured and then spliced together. This segmentation allows each small mold to be produced with high precision using existing techniques, while the overall large-area mold achieves the required size through careful splicing of these segments at overlapping regions.
2Area of stationary object
If small molds are arranged closely to form large-area mold, then the manufacturing area is improved, but overlapping and height differences occur, hence invalid nanoimprint areas are formed
Solution Approach 1:
The patent applies different structural characteristics to different regions of the mold. At the splicing interfaces, overlapping regions are created with specific depth relationships (one mold pattern deeper than the other) to ensure proper alignment and eliminate height differences. The non-interface regions maintain the original nano-structure patterns for nanoimprint operations.
3Area of stationary object
If Step-and-Repeat method is used to produce large-area mold, then the manufacturing area is improved, but splicing accuracy and continuity are difficult to achieve
Solution Approach 1:
The patent performs preliminary actions by creating overlapping regions between adjacent mold patterns during the manufacturing process. These overlapping regions are formed with predetermined depth relationships before the final splicing operation, which facilitates accurate alignment and reduces the difficulty of achieving precise splicing interfaces.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces manufacturing costs and improves the accuracy and quality of large-area nanoimprint molds by eliminating height differences and overlapping issues, enabling the production of larger patterns from smaller molds with enhanced precision.
Implementation Method 1
forming a first mold pattern on the first layer, wherein the region of the first mold pattern completely overlaps the region of the vertical projection of the first hollow area on the first layer
Implementation Method 2
disposing a first hard mask layer on the first layer, wherein the first hard mask layer includes one or more first hollow area via photolithography
Data Source
AI summary
An imprint mold and a method for manufacturing the same are provided. The imprint mold includes a plurality of substantially identical or different mold patterns, wherein there isn't any height difference between the mold patterns. The imprint mold manufacturing method includes: disposing a first layer on a substrate; disposing a first hard mask layer on the first layer, wherein the first hard mask layer includes one or more first hollow area; forming a first mold pattern on the first layer by imprinting, wherein the region of the first mold pattern completely overlaps the region of the vertical projection of the first hollow area on the first layer; removing the first hard mask layer; disposing a second hard mask layer on the first layer, wherein the second hard mask layer includes one or more second hollow area, wherein the region of the vertical projection of the second hollow area on the first layer is adjacent to the first mold pattern; forming a second mold pattern on the first layer by imprinting, wherein the region of the second mold pattern completely overlaps the region of the vertical projection of the second hollow area on the first layer; and removing the second hard mask layer.