Imprint Mold Surface Treatment for Residual Film Removal
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Solution Overview
Problem
The imprint lithography method for forming patterns in display devices often results in residual films due to the undesirable interaction between the mold and the light shielding material, leading to poor reproducibility and additional processing requirements for removing these residues.
Innovation Solution
The method involves surface treatment of the substrate to adjust the interface tensions between the substrate and the light shielding material, using CF4 plasma treatment or O2/CF4 plasma and self-assembly monolayer treatments, to facilitate the removal of residual films by forming a mold with a light shielding film that can effectively separate from the master layer and insulation substrate, ensuring precise pattern formation and minimizing residual film formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If imprint lithography method is used to form patterns, then manufacturing cost is reduced and process is simplified, but residual films remain on the substrate due to undesirable interaction between mold and light shielding material
Solution Approach 1:
The invention changes the surface energy parameters of the master layer by applying surface treatments (plasma treatment, self-assembly monolayer treatment) to modify its chemical composition and physical properties. This parameter change creates a surface with lower surface energy that prevents adhesion of light shielding material, thereby eliminating residual film formation while maintaining the simplicity of imprint lithography
Solution Approach 2:
The invention introduces an intermediary substance (surface treatment layer such as plasma-treated layer or self-assembly monolayer) between the master layer and the light shielding material. This intermediary layer acts as a release agent that prevents direct adhesion between the mold and the material being molded, allowing clean separation without residual films
2Manufacturing precision
If light shielding material is sprayed onto color filter pattern, then openings are covered effectively, but light shielding material adheres to solid portions of color filter creating residual films
Solution Approach 1:
The invention applies different surface properties to different regions: the master layer regions corresponding to openings are treated to have low adhesion to light shielding material, while other regions maintain normal properties. This local differentiation allows light shielding material to be deposited precisely in opening regions without adhering to solid portions of the color filter
3Device complexity
If mold is formed without surface treatment, then manufacturing process is simpler, but mold separation from master layer is difficult and residual films remain
Solution Approach 1:
The invention performs preliminary surface treatment on the master layer before forming the mold. This preliminary action modifies the surface properties in advance to prevent adhesion, ensuring that when the mold is later separated from the master layer, it can be easily removed without residual films, thereby improving reliability without significantly increasing complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for the effective removal of residual films during the molding process, improving pattern reproducibility and reducing the need for additional processing steps, thereby enhancing the manufacturing efficiency and quality of display devices.
Implementation Method 1
the surface treatment includes a CF4 plasma treatment
Implementation Method 2
increasing the difference in interface tensions between the master layer and the light shielding material through the surface treatment
Implementation Method 3
jetting a light shielding material inside the opening after treating a surface of the base substrate exposed through the opening of the master layer and increasing the difference in interface tensions
Data Source
AI summary
A method of manufacturing a display device in which a film deposited on a substrate through openings in a covering layer is easily removed from the covering layer, is described herein, includes forming a master layer having a predetermined pattern of openings on a base substrate; spraying a light shielding material on the master layer; fabricating a mold provided with the light shielding film by forming a moldable material layer on the base substrate and the master layer; the moldable material layer and the light shielding material; arranging, pressurizing, and exposing the mold on an insulation substrate having a photosensitive film formed thereon after separating the mold from the master layer; and developing the photosensitive film after separating the mold from the insulation substrate.