Imprint Apparatus Overlay Control Using Deformation and Mark Selection
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Solution Overview
Problem
Existing imprint apparatuses face challenges in accurately overlaying pattern regions on molds with substrate regions due to intentional positional shifts between marks, making feedback control difficult and affecting overlay accuracy.
Innovation Solution
The method involves performing deformation control on either the pattern or shot region to bring their shapes close, determining shift amounts between marks, selecting marks for overlay control based on these shifts, and using feedback control to correct positional mismatches, allowing for precise alignment between the pattern and shot regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If feedback control is performed to match marks with intentional positional shifts, then overlay control can be performed, but accurate overlaying of pattern region and shot region becomes difficult
Solution Approach 1:
The patent divides the plurality of marks into multiple groups based on their shift amounts, selecting different marks for different control purposes. Some marks are used for deformation control while others are used for overlay control, avoiding the conflict of using all marks for overlay control when they have intentional shifts.
Solution Approach 2:
The patent applies different selection criteria to different marks based on their local characteristics (shift amounts). Marks with smaller shift amounts are selected for overlay control, while marks with larger shift amounts may be used for deformation control or excluded from overlay control, optimizing the local utility of each mark.
2Manufacturing precision
If deformation control is performed to bring shapes close, then alignment precision is improved, but device complexity increases due to additional control steps
Solution Approach 1:
The patent performs deformation control as a preliminary step before overlay control. By pre-deforming the pattern region or shot region to bring their shapes close, the subsequent overlay control becomes more effective and requires less complex adjustment, as the major shape mismatches are already corrected.
Solution Approach 2:
The patent implements feedback control by measuring the actual positions of marks after deformation and using this information to adjust the overlay control parameters. This closed-loop approach improves alignment precision while keeping the control process manageable through iterative refinement rather than complex open-loop control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables accurate overlaying of pattern regions on molds with substrate regions, improving alignment precision and maintaining throughput by selectively using fewer detection units and optimizing deformation techniques.
Implementation Method 1
performing control for deformation of at least one of the pattern region and the shot region so as to bring a shape of the pattern region and a shape of the shot region close to each other
Implementation Method 2
a technique of deforming the shot region by heating the substrate
Data Source
AI summary
The present invention provides an imprint method of forming a pattern on a shot region formed on a substrate by using a mold having a pattern region, the method comprising performing control for deformation of at least one of the pattern region and the shot region in accordance with a deformation amount, obtaining a shift amount between each of a plurality of marks provided on the pattern region and a corresponding one of a plurality of marks provided, on the shot region after the deformation, selecting marks to be used for controlling an overlay between the pattern region and the shot region so as to satisfy a preset condition based on the shift amounts, and performing feedback control for the overlay based on detection results on positions of the selected marks, after the deformation in the performing control for deformation.