Imprint Apparatus Real-Time Overlay Control

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Solution Overview

Problem

Existing imprint techniques lack precise feedback control of substrate heating during the overlay process, leading to inaccuracies in transferring patterns from molds to substrates, as they rely on pre-determined thermal doses without measuring shape differences between the mold and substrate patterns.

Innovation Solution

An imprint apparatus equipped with a heater, measurement device, and controller that measures the overlay state between the mold and substrate, adjusting the heat flow rate to maintain the shape difference within a tolerance, ensuring accurate pattern transfer by deforming the substrate in real-time.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If pre-determined thermal dose is used for substrate heating, then the heating process is simple and quick, but overlay precision deteriorates due to inability to compensate for shape differences

Engineering Contradiction:
Improveoverlay precisionVSAvoidheating control complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent implements feedback control by measuring the shape difference between mold and substrate patterns, then adjusting the thermal dose applied to the substrate. The controller modifies heating parameters based on measured overlay errors, creating a closed-loop system that continuously corrects shape mismatches to achieve precise overlay alignment.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent dynamically changes heating parameters (thermal dose, temperature, heating duration) based on measured shape differences. By adjusting these thermal parameters in response to actual overlay conditions, the system compensates for manufacturing variations and achieves precise pattern alignment without requiring fixed pre-determined heating values.

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If thermal dose is decided before heating starts, then the process is efficient and fast, but measurement precision of shape difference is compromised due to lack of real-time adjustment

Engineering Contradiction:
Improveshape difference measurement accuracyVSAvoidheating adjustment time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent maintains continuous measurement and adjustment during the heating process. Rather than performing discrete pre-heating and post-heating measurements, the system continuously monitors shape differences and adjusts thermal parameters throughout the heating cycle, ensuring measurement accuracy is maintained without significant time loss.

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The patent performs preliminary measurement of shape differences before applying thermal dose, and uses this information to pre-adjust heating parameters. This preliminary action allows the system to compensate for anticipated shape changes, maintaining measurement precision while minimizing the time required for iterative adjustments during heating.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances overlay precision by dynamically controlling the heating process based on real-time measurements, allowing for accurate alignment and pattern transfer, even in the presence of manufacturing errors or thermal deformations.

Implementation Method 1

a heater configured to deform the target region by heating the substrate

Methodology Applied
Scientific EffectThermal expansion: Thermal Expansion

Data Source

PatentUS9927700B2Imprint apparatus, and method of manufacturing article
Publication Date: 2018.03.27 CANON KK
  • US9927700B2 patent drawing
  • US9927700B2 patent drawing
  • US9927700B2 patent drawing

AI summary

The present invention provides an imprint apparatus for molding an imprint material on a target region on a substrate using a mold to form a pattern on the target region, the apparatus comprising a heater configured to deform the target region by heating the substrate, a measurement device configured to measure an overlay state between the target region and the mold, and a controller configured to control the heater such that the overlay state falls within a tolerance.