Imprint Particle Detection Between Mold and Substrate
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Solution Overview
Problem
Existing imprint methods struggle to accurately detect particles in the space between the mold and substrate during the imprint process, leading to potential pattern defects and reduced productivity due to delayed detection and incomplete particle removal.
Innovation Solution
An imprint apparatus equipped with a suction unit to capture gas between the mold and substrate, a detector to count particles, and a control unit to manage errors based on detection results, ensuring timely intervention and maintaining a clean environment for pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If particles are detected in the outside space using existing methods, then the apparatus stops to prevent particle adhesion, but productivity is lowered due to unnecessary stops when particles are not actually affecting the imprint space
Solution Approach 1:
The detection space is segmented into two distinct regions: the imprint space (between mold and substrate) and the outside space. Particle detectors are strategically positioned to monitor each region independently, allowing the system to distinguish between particles that affect pattern formation and those that do not, thereby avoiding unnecessary production stops
Solution Approach 2:
Gas flow acts as an intermediary medium that transports particles from the outside space toward the imprint space. By monitoring particle concentration in the gas flow path and using suction units to control gas movement, the system can predict and prevent particle entry into the imprint space before actual contamination occurs
2Object-affected harmful factors
If gas supply amount is increased to decrease particle concentration in the imprint space, then particle adhesion is reduced, but detection accuracy is compromised because particles are detected only when spreading and attenuating
Solution Approach 1:
Particle detection is performed in advance, before particles enter the imprint space and before gas supply adjustments are made. Detectors are positioned to capture particles in the gas flow path upstream of the imprint space, enabling early warning and preventive action while particle concentration is still high and detectable
Solution Approach 2:
The system replaces reactive gas supply adjustment with proactive particle removal using suction units. Instead of increasing gas supply to dilute particles after detection, suction units actively extract particles from the gas flow, providing more precise and immediate particle concentration control
3Manufacturing precision
If the apparatus maintains a cleaner state in the imprint space by preventing particle entry, then pattern formation is protected, but the system becomes overly sensitive to particles in the outside space
Solution Approach 1:
Different quality requirements are applied to different spatial zones: the imprint space maintains ultra-clean conditions through active particle removal, while the outside space allows higher particle tolerance. Gas supply ports and suction units are locally positioned to create controlled flow patterns that protect the critical imprint region without requiring complete sterilization of the entire apparatus
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively detects particles in real-time, preventing pattern defects and maintaining productivity by promptly stopping the process when particles are detected, allowing for immediate cleaning and reducing the likelihood of particle-induced errors.
Implementation Method 1
a suction unit provided at the mold holding unit and configured to suction a gas in a space in which the mold and the substrate face each other
Data Source
AI summary
An imprint apparatus that forms a pattern of an imprint material on a substrate with use of a mold includes a mold holding unit configured to hold the mold, a suction unit provided at the mold holding unit and configured to suction a gas in a space in which the mold and the substrate face each other, a detector configured to detect particles included in the gas suctioned by the suction unit, and a control unit configured to perform error processing depending on a result of detection performed by the detector.