Imprint Pattern Formation With Regional Exposure Control
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Solution Overview
Problem
The protrusion of imprint material during the imprint process leads to contamination, mold damage, and alignment issues due to curing of the protruded material, which affects the quality and yield of the manufacturing process.
Innovation Solution
A method involving a first and second pattern forming process with controlled exposure amounts to prevent the protrusion of imprint material by limiting exposure to specific regions, using mechanisms like opening mechanisms, light shielding blades, or DMD elements to manage exposure light distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a light shielding material is disposed on a mold to prevent light from being applied to a region where the imprint material protrudes, then the protruding imprint material can be prevented from being cured, but exposure light enters the boundary between the light shielding material and the pattern region and causes the protruding imprint material to be cured
Solution Approach 1:
The patent segments the exposure process into multiple stages with different exposure amounts. The first exposure process applies a first exposure amount to the imprint material, and the second exposure process applies a second exposure amount that is smaller than the first. This segmentation allows precise control of where and how the protruding material is cured, preventing curing in unwanted areas while ensuring proper curing in the pattern region.
Solution Approach 2:
The patent applies different exposure amounts to different regions of the imprint material. The pattern region receives full exposure to ensure proper curing, while the boundary region and areas where material protrudes receive reduced or no exposure. This local differentiation of exposure quality prevents the protruding material from being cured while maintaining manufacturing precision.
2Object-generated harmful factors
If the mold presses the protruded cured imprint material during the pressing of the next adjacent shot, then the protruded material may peel off and become particles that contaminate the apparatus or damage the mold, but preventing this requires avoiding curing of protruding material which complicates the exposure process
Solution Approach 1:
The patent performs preliminary action by controlling the exposure process to prevent the protruding imprint material from curing in the first place. The first exposure process is carefully controlled so that the protruding material does not receive sufficient exposure to cure. This preliminary prevention eliminates the source of future problems (peeling and particle generation) without requiring complex additional measures during subsequent pressing operations.
3Productivity
If the control of alignment is disturbed due to frictional force generated when the cured imprint material is pressed, then a delay in convergence is caused, but preventing friction requires preventing curing of protruding material which affects process control
Solution Approach 1:
The patent changes the exposure parameter (exposure amount) as a function of position and process stage. The first exposure amount is applied to the general pattern region, while the second exposure amount (smaller than the first) is applied to specific regions including boundaries and areas prone to protrusion. This parameter change ensures that protruding material does not cure and generate friction, maintaining fast alignment convergence while preserving manufacturing precision through controlled exposure distribution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents the curing of protruded imprint material, reducing defects and improving manufacturing yield by controlling exposure to minimize protrusion and subsequent material deformation.
Implementation Method 1
exposes the imprint material with light or the like to cure the material to form a pattern consisting of the cured imprint material on the substrate
Data Source
AI summary
In order to realize an imprint method capable of reducing a drawback caused by protrusion of an imprint material, the imprint method includes a first pattern forming process of bringing a mold into contact with an imprint material on a first pattern forming region on a substrate; a first exposure process of exposing an imprint material on the first pattern forming region and making an amount of exposure for the imprint material on a partial region of the first pattern forming region smaller; a second pattern forming process of bringing the mold into contact with an imprint material on a second pattern forming region after the first pattern forming process to form a pattern; and a second exposure process of exposing the imprint material on the second pattern forming region and the imprint material on the partial region of the first pattern forming region.