Imprint Apparatus Pattern Formation Sequence Control
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Solution Overview
Problem
In imprint apparatuses, thermal expansion and contraction of substrates due to ultraviolet irradiation and mold temperature can lead to inaccurate magnification correction and pattern defects caused by scattered resin droplets during the imprint process.
Innovation Solution
An imprint apparatus with a controller that controls the dispensing of imprint material to form patterns in a specific order relative to a gas flow, ensuring that the next adjacent imprint region is not influenced by thermal effects and minimizing resin mist scattering, thereby reducing pattern defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the imprint process is performed in sequential order on adjacent imprint regions, then productivity is improved, but thermal expansion and contraction cause magnification correction errors and pattern defects
Solution Approach 1:
The system performs preliminary identification of the imprint region's position in the sequence before performing the imprint process. Based on this identified sequence position, the magnification correction value is adjusted in advance to compensate for thermal expansion/contraction that will occur during the imprint process, thereby maintaining pattern formation accuracy despite sequential processing
Solution Approach 2:
The system calculates magnification correction values based on the identified sequence position of each imprint region, creating a feedback mechanism where the processing order information is used to dynamically adjust correction parameters. This ensures that each region receives appropriate magnification compensation based on its position in the thermal sequence
2Productivity
If resin is dispensed to multiple imprint regions, then productivity is improved, but resin mist scatters to adjacent regions causing pattern defects
Solution Approach 1:
The system performs preliminary identification of which imprint regions have already been processed before dispensing resin to the next region. By controlling the dispensing operation based on this identified processing sequence, the system minimizes resin mist scattering to adjacent regions that have already been imprinted, thereby reducing pattern defects
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces pattern defects by controlling the imprint process to account for thermal influences and minimizing resin mist scattering, ensuring accurate and uniform pattern formation across multiple imprint regions.
Implementation Method 1
a mold is released after the resin is cured by ultraviolet irradiation
Implementation Method 2
the imprint region where the imprint process has been performed immediately before and its peripheral substrate thermally expand or contract due to the influences of heat of ultraviolet irradiation and the temperature of the mold
Data Source
AI summary
An imprint apparatus includes: a dispenser configured to dispense an imprint material to the imprint region; and a controller configured to control the imprint process so that a pattern is formed in a first imprint region, located upstream of a second imprint region with respect to a gas flow between the dispenser and the substrate, earlier than in the second imprint region.