Imprint Apparatus Reference Plate Positioning

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Solution Overview

Problem

In imprint processes, the reference plate is often damaged due to discharge between the charged mold and the reference plate during the separation of the mold and cured imprint material, as the reference plate passes under the charged mold.

Innovation Solution

The imprint apparatus is designed with a reference plate positioned between a virtual straight line perpendicular to the mold holder's view and the substrate holder's edge, ensuring sufficient spacing between the mold and the reference plate to prevent discharge and damage, and includes a charge removing device to reduce static charges on the mold.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the reference plate is positioned to pass below the charged mold during the imprint process, then the alignment and calibration functions are maintained, but discharge occurs between the mold and reference plate causing damage

Engineering Contradiction:
Improvereference plate durabilityVSAvoiddischarge damage
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The reference plate is extracted from the path below the mold and repositioned to the side of the substrate holder. This removes the reference plate from the harmful electric field zone, preventing discharge damage while preserving its alignment and calibration functions through alternative positioning.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The substrate holder edge acts as an intermediary element that positions the reference plate laterally offset from the mold path. This intermediate positioning structure allows the reference plate to remain functional for alignment purposes while being shielded from direct exposure to charged mold discharge.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Object-affected harmful factors

If the reference plate is repositioned to the side of the substrate holder, then discharge damage is prevented, but the alignment scope's ability to capture the reference mark may be affected

Engineering Contradiction:
Improvedischarge preventionVSAvoidmark capture accuracy
Core Design Contradiction:
Object-affected harmful factorsVSMeasurement precision

Solution Approach 1:

The reference plate is repositioned from a vertical arrangement (directly below the mold) to a lateral arrangement (at the side of the substrate holder). This dimensional change in positioning allows the alignment scope to capture the reference mark from a different angular perspective while maintaining measurement precision and preventing discharge.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The reference plate is positioned asymmetrically at one side of the substrate holder rather than centrally below the mold. This asymmetric positioning creates sufficient lateral distance from the mold path to prevent discharge while the alignment scope maintains its ability to capture the reference mark for precise alignment measurements.

Inventive Principle:
Principle #4Asymmetry

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This arrangement effectively reduces the likelihood of discharge and damage to the reference plate, enhancing the reliability and longevity of the imprint apparatus while maintaining productivity.

Implementation Method 1

the reference mark can be formed by an electrically conductive reflecting film such as a chromium film

Methodology Applied
Scientific EffectLight reflection: Reflection

Implementation Method 2

since the reference plate passes below the charged mold, discharge may occur between the mold and the reference plate

Methodology Applied
Scientific EffectElectrostatic discharge: Electrostatic Discharge

Data Source

PatentUS10859912B2Imprint apparatus, imprint method, and article manufacturing method
Publication Date: 2020.12.08 CANON KK
  • US10859912B2 patent drawing
  • US10859912B2 patent drawing
  • US10859912B2 patent drawing

AI summary

An imprint apparatus includes a mold holder for holding a mold, a substrate holder for holding a substrate, a dispenser for arranging imprint material on the substrate, and a scope for capturing an image of a mark. The substrate holder includes a reference plate having a reference mark whose image is captured by the scope, the dispenser is arranged in a first direction when viewed from the mold holder, and the reference plate is arranged between a virtual straight line which is parallel to a second direction perpendicular to the first direction when viewed from the mold holder and passes through a center of the substrate holder, and an edge of the substrate holder located in the first direction when viewed from the virtual straight line.