Imprint Optical System With Shared Multi-Wavelength Curing and Deformation
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Solution Overview
Problem
Existing imprint apparatuses face challenges in efficiently integrating multiple devices for curing, deformation, and alignment due to limited space, leading to potential size increases and operational complexity.
Innovation Solution
An imprint apparatus utilizing a modulator to modulate incident light from multiple light sources with different wavelengths, allowing for simultaneous deformation and curing processes through a shared optical system, including a digital mirror device (DMD) to control light intensity and distribution for precise alignment and pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple devices (curing unit, deformation unit, detection system) are disposed above the mold holding mechanism, then various functions can be integrated, but the apparatus size increases and space becomes limited
Solution Approach 1:
The patent combines multiple optical systems (curing optical system, deformation optical system, detection optical system) into a shared optical path structure. Different light sources and optical components are merged to operate through a common illumination path, reducing the overall apparatus volume while maintaining all required functions.
Solution Approach 2:
The illumination optical system is designed to serve multiple functions: it can deliver curing light, deformation light, and detection light sequentially or simultaneously. The optical components are configured to be universal, handling different wavelengths and functions through the same physical pathway, thereby eliminating the need for separate dedicated optical systems for each function.
2Adaptability or versatility
If various devices are disposed in the limited space above the mold, then functional integration is achieved, but device complexity increases
Solution Approach 1:
The patent segments the optical system into distinct functional modules (curing unit, deformation unit, detection system) that operate independently but share the common illumination path. Each module can be controlled and adjusted separately, managing complexity through modular design while achieving functional integration.
Solution Approach 2:
The system employs dynamic control mechanisms where the illumination optical system can switch between different functions (curing, deformation, detection) and adjust parameters like wavelength, intensity, and timing based on operational requirements. This dynamic adaptability allows a single system to perform multiple functions without permanent structural complexity.
3Productivity
If light from multiple light sources with different wavelengths is guided to the modulator, then simultaneous deformation and curing is enabled, but optical system complexity increases
Solution Approach 1:
The patent implements continuous operation where multiple light sources with different wavelengths are guided through the optical system without interruption. The modulator sequentially or simultaneously directs curing light and deformation light through the shared optical path, maintaining continuous productive action without requiring separate complete optical systems for each wavelength.
Solution Approach 2:
The modulator serves as an intermediary component that receives light from multiple light sources with different wavelengths and directs them appropriately through the shared optical system. It mediates between the multiple light sources and the substrate, enabling simultaneous deformation and curing functions while managing the complexity of handling multiple wavelengths through a single optical pathway.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient integration of multiple functions without increasing apparatus size, enhancing precision and efficiency in imprint processing by allowing for simultaneous deformation and curing of imprint materials on substrates.
Implementation Method 1
a modulator configured to modulate incident light, a first optical system configured to guide first light from a first light source to the modulator, and second light from a second light source that has a wavelength different from that of the first light to the modulator
Implementation Method 2
including a digital mirror device (DMD) to control light intensity and distribution for precise alignment and pattern formation
Implementation Method 3
an imprint apparatus that drips a resist onto a pattern formation region of a substrate, pushes a template against the resist, emits light onto a light irradiated region including a boundary between the pattern formation region and an outer region of the pattern formation region, and then, emits light onto the pattern formation region. By the light emission onto the light irradiated region, the resist on the light irradiated region cures
Implementation Method 4
Japanese Patent Application Laid-Open No. 2013-102132 discusses an imprint apparatus including a heating mechanism that deforms a pattern region of a substrate by heating
Implementation Method 5
a shape correcting mechanism that deforms a pattern region of a mold
Data Source
AI summary
An imprint apparatus executes imprint processing of curing imprint material in a state in which the imprint material supplied onto a substrate and a mold are in contact with each other. The imprint apparatus includes a modulator configured to modulate incident light, a first optical system configured to guide first light from a first light source to the modulator, and second light from a second light source that has a wavelength different from that of the first light to the modulator, and a second optical system configured to guide modulated light modulated by the modulator to the substrate.