Imprint Apparatus Shearing Force Control for Overlay Accuracy

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Solution Overview

Problem

Conventional imprint techniques struggle to maintain overlay accuracy between a mold and a substrate due to the influence of small surface unevenness, underlying pattern depth, and residual film thickness of the imprint material.

Innovation Solution

An imprint apparatus that includes an obtainment unit to gather information on the geometric shape of the surface pattern, thickness of the layer, film thickness of the imprint material, and the shearing force generated, and a control unit to calculate and achieve a target film thickness for optimal shearing force, thereby improving overlay accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If the residual film thickness of the imprint material is increased, then the shearing force decreases, but relative vibration between the mold and substrate increases causing degradation of overlay accuracy

Engineering Contradiction:
Improveshearing forceVSAvoidoverlay accuracy
Core Design Contradiction:
StrengthVSManufacturing precision

Solution Approach 1:

The invention changes the physical parameters of the imprint material by controlling its residual film thickness to an optimal range. By adjusting this parameter, the shearing force is optimized to provide sufficient friction for preventing mold-substrate relative vibration while maintaining appropriate flow characteristics for complete pattern filling, thereby resolving the contradiction between strength and manufacturing precision.

Inventive Principle:
Principle #35Parameter changes

2Strength

If the residual film thickness of the imprint material is decreased, then the shearing force increases, but distortion of the mold occurs causing degradation of overlay accuracy

Engineering Contradiction:
Improveshearing forceVSAvoidmold distortion
Core Design Contradiction:
StrengthVSStability of the object's composition

Solution Approach 1:

The invention optimizes the residual film thickness parameter to balance shearing force generation with mold stability. By maintaining the film thickness within a specific range, sufficient shearing force is generated to drive pattern filling while preventing excessive force that would cause mold distortion, thus resolving the contradiction between strength and stability.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If the depth of underlying pattern and thickness of underlying layer are not controlled, then the shearing force becomes unpredictable, but overlay accuracy degrades due to insufficient control of imprint material behavior

Engineering Contradiction:
Improveoverlay accuracyVSAvoidprocess control complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The invention identifies and controls key parameters including the depth of the underlying pattern and the thickness of the underlying layer. By establishing specific ranges for these parameters along with residual film thickness, the shearing force becomes predictable and controllable, enabling consistent overlay accuracy without requiring overly complex process control systems.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus effectively suppresses degradation of overlay accuracy by generating an appropriate shearing force in the imprint material, enhancing the alignment and pattern transfer precision between the mold and the substrate.

Implementation Method 1

a shearing force generated in the imprint material in a state in which the mold is in contact with the imprint material on the substrate

Methodology Applied
Scientific EffectViscosity: Viscometer

Implementation Method 2

The photo-curing method is a method of curing an imprint material by irradiating it with light (such as ultraviolet light) while the imprint material arranged on a substrate is in contact with a mold

Methodology Applied
Scientific EffectPhoto-curing: Photopolymerisation

Data Source

PatentUS20250073963A1Imprint apparatus, imprint method, information processing apparatus and article manufacturing method
Publication Date: 2025.03.06 CANON KK
  • US20250073963A1 patent drawing
  • US20250073963A1 patent drawing
  • US20250073963A1 patent drawing

AI summary

An imprint apparatus for forming, by using a mold, a pattern of an imprint material on a layer formed on a surface pattern existing in a substrate, the apparatus including a calculation unit configured to output, based on information indicating a relationship among a geometric shape of the surface pattern, a thickness of the layer, a film thickness of the imprint material existing between the mold and the layer in a state in which the mold is in contact with the imprint material, and a shearing force generated in the imprint material in the state, a target film thickness of the imprint material required for generating the target shearing force in the imprint material, if the geometric shape of the surface pattern, the thickness of the layer, and a target shearing force are input.