Imprint Apparition Stage Alignment Oscillation Control
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Solution Overview
Problem
Conventional imprint apparatuses experience alignment precision degradation due to oscillation in the substrate stage caused by measurement and information transmission delays during the curing process, leading to inaccurate pattern transfer on the substrate.
Innovation Solution
An imprint apparatus with a movable stage, positional deviation detector, curing device, and controller that adjusts the stage movement and curing timing based on detected positional deviations, ensuring alignment precision by starting curing only when the deviation falls within an allowable range during stage movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the stage is moved based on feedback from scope measurement, then alignment between mold and substrate is improved, but oscillation occurs in stage movement due to measurement and information transmission delay
Solution Approach 1:
The system performs preliminary alignment adjustment by moving the stage to a target position calculated from initial scope measurement before curing begins. This preliminary action establishes the baseline alignment without triggering oscillation during the critical curing phase.
Solution Approach 2:
The system implements periodic measurement and adjustment cycles: initial measurement and stage movement, followed by continuous monitoring during curing. The curing process is controlled to occur at specific periodic intervals when alignment is verified to be within acceptable ranges.
2Productivity
If curing is performed at decided timing regardless of oscillation, then productivity is maintained, but alignment precision is degraded
Solution Approach 1:
The system continuously monitors stage position and alignment status during the curing process. Based on this feedback, the curing device is controlled to irradiate only when alignment remains within predetermined acceptable ranges, automatically adjusting curing timing to maintain precision without significant productivity loss.
Solution Approach 2:
The system dynamically adjusts the curing parameter (irradiation timing) based on real-time alignment conditions. By changing the curing state from continuous to conditional间歇式 irradiation, the system maintains alignment precision while minimizing productivity impact.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach ensures high alignment precision and overlay accuracy by eliminating oscillation in stage movement and optimizing the curing timing, thereby maintaining the accuracy of pattern transfer on the substrate.
Implementation Method 1
a detector configured to detect a positional deviation between the mold and the substrate
Implementation Method 2
a photo-curing method in which the imprint material on the substrate is cured by irradiation of light such as ultraviolet light
Data Source
AI summary
An imprint apparatus is operable to perform an imprint process, which is for forming a pattern on an imprint material on a substrate by using a mold, for each of shot regions of the substrate. The apparatus includes a controller configured to control alignment between the mold and the substrate. The controller determines a target position obtained by adding a predetermined additional amount to a movement amount of a substrate stage according to a positional deviation between the mold and the substrate, starts movement of the stage towards the determined target position, and starts curing of the imprint material by a curing device at a timing at which the detected positional deviation falls within an allowable range during the movement of the stage.